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Author:

Yan, Xiao (Yan, Xiao.) | Zhu, Tianle (Zhu, Tianle.) | Fan, Xing (Fan, Xing.) | Sun, Yifei (Sun, Yifei.)

Indexed by:

EI Scopus SCIE

Abstract:

Volatile organic pollutants in mist are becoming of great concern around the world. In the present study, removal of p-chlorophenol (4-CP) in mist by corona discharge plasma was investigated using a link tooth wheel-cylinder plasma reactor energized by a positive DC power supply. The results indicate that the corona discharge is effective in removal of 4-CP in mist. The removal of 4-CP and TOC (total organic carbon) improves as input power increases. With the help of Gaussian03 package program combined with frontier orbital theory and density functional theory, it was speculated that 4-chlorocatechol was the dominating hydroxylated intermediate and C-CI would be initially attacked by the plasma species to form CI-due to its longest bond length, which is verified by HPLC and IC analysis results of 4-CP degradation products. Most of the chlorine atoms are released from the removed 4-CP to form CI-. The CI- takes up more than 93% while the 4-chlorocatechol accounts for less than 1% of the reacted chlorine. The ring-opening (maleic and oxalic acids) and ring-containing products (mainly 4-chlorocatechol) account for less than 50% and 1% of the converted carbon respectively under the investigated conditions, with the other converted carbon being contained in inorganic products such as CO2 and CO. Both short-living and long-living plasma species contribute to 4-CP degradation. Based on the analysis of 4-CF degradation products and the roles of active species in 4-CP degradation, possible pathways of 4-CP degradation in mist were proposed. (C) 2014 Elsevier B.V. All rights reserved.

Keyword:

Ozone 4-chloropbenol Mist DC corona discharge plasma OFF

Author Community:

  • [ 1 ] [Yan, Xiao]Beihang Univ, Sch Chem & Environm, Beijing 100191, Peoples R China
  • [ 2 ] [Zhu, Tianle]Beihang Univ, Sch Chem & Environm, Beijing 100191, Peoples R China
  • [ 3 ] [Sun, Yifei]Beihang Univ, Sch Chem & Environm, Beijing 100191, Peoples R China
  • [ 4 ] [Fan, Xing]Beijing Univ Technol, Coll Environm & Energy Engn, Beijing 100124, Peoples R China

Reprint Author's Address:

  • [Zhu, Tianle]Beihang Univ, Sch Chem & Environm, Beijing 100191, Peoples R China

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Source :

CHEMICAL ENGINEERING JOURNAL

ISSN: 1385-8947

Year: 2014

Volume: 245

Page: 41-46

1 5 . 1 0 0

JCR@2022

ESI Discipline: ENGINEERING;

ESI HC Threshold:176

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 21

SCOPUS Cited Count: 30

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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