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Author:

Zheng, Kun (Zheng, Kun.) (Scholars:郑坤) | Shao, Ruiwen (Shao, Ruiwen.) | Deng, Qingsong (Deng, Qingsong.) | Zhang, Yuefei (Zhang, Yuefei.) (Scholars:张跃飞) | Li, Yujie (Li, Yujie.) | Han, Xiaodong (Han, Xiaodong.) (Scholars:韩晓东) | Zhang, Ze (Zhang, Ze.) | Zou, Jin (Zou, Jin.)

Indexed by:

EI Scopus SCIE

Abstract:

In this study, enhancements of the carrier transport properties of p-type < 100 >-oriented Si whiskers are observed under uniaxial tensile and compressive strains. It has been found that over 400% enhancement of electrical conductivity is achieved under a 2% tensile strain, while a 2% compressive strain can only cause similar to 80% conductivity enhancement. The enhancements are mainly attributed to the breaking of the degeneracy of the v2 and v1 valence bands induced a reduction of the hole effective mass. This study provides an important insight of how the carrier mobility variation caused by the strain impact on their transport properties. (C) 2014 AIP Publishing LLC.

Keyword:

Author Community:

  • [ 1 ] [Zheng, Kun]Beijing Univ Technol, Inst Microstruct & Properties Adv Mat, Beijing 100124, Peoples R China
  • [ 2 ] [Shao, Ruiwen]Beijing Univ Technol, Inst Microstruct & Properties Adv Mat, Beijing 100124, Peoples R China
  • [ 3 ] [Deng, Qingsong]Beijing Univ Technol, Inst Microstruct & Properties Adv Mat, Beijing 100124, Peoples R China
  • [ 4 ] [Zhang, Yuefei]Beijing Univ Technol, Inst Microstruct & Properties Adv Mat, Beijing 100124, Peoples R China
  • [ 5 ] [Li, Yujie]Beijing Univ Technol, Inst Microstruct & Properties Adv Mat, Beijing 100124, Peoples R China
  • [ 6 ] [Han, Xiaodong]Beijing Univ Technol, Inst Microstruct & Properties Adv Mat, Beijing 100124, Peoples R China
  • [ 7 ] [Zhang, Ze]Zhejiang Univ, Dept Mat Sci, Hangzhou 310058, Zhejiang, Peoples R China
  • [ 8 ] [Zou, Jin]Univ Queensland, Brisbane, Qld 4072, Australia
  • [ 9 ] [Zou, Jin]Univ Queensland, Ctr Microscopy & Microanal, Brisbane, Qld 4072, Australia

Reprint Author's Address:

  • 郑坤

    [Zheng, Kun]Beijing Univ Technol, Inst Microstruct & Properties Adv Mat, Beijing 100124, Peoples R China

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Source :

APPLIED PHYSICS LETTERS

ISSN: 0003-6951

Year: 2014

Issue: 1

Volume: 104

4 . 0 0 0

JCR@2022

ESI Discipline: PHYSICS;

ESI HC Threshold:202

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 16

SCOPUS Cited Count: 17

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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