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Author:

邓金祥 (邓金祥.) (Scholars:邓金祥) | 满超 (满超.) | 崔敏 (崔敏.) | 康成龙 (康成龙.) | 赵卫平 (赵卫平.)

Abstract:

<正>立方氮化硼(c-BN)是人工合成的Ⅲ-Ⅴ族闪锌矿结构化合物半导体材料,它具有类似于甚至优于金刚石的优良的物理、化学性质而成为人们研究的热点。例如:c-BN的禁带宽度很大(6~6.4eV),可实现n型和p型掺杂(而金刚石的n型掺杂极其困难)[1],因此可用于制备高温、高频、大功率微电子器件和短波光电子器件[2]。然而,制作这些器件

Keyword:

立方氮化硼薄膜 电流电压特性曲线 金属半导体接触

Author Community:

  • [ 1 ] 北京工业大学应用数理学院

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Source :

Year: 2011

Language: Chinese

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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