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Author:

Li, Yujia (Li, Yujia.) | Gao, Bin (Gao, Bin.) | Wu, Huaqiang (Wu, Huaqiang.) | Zhang, Wanrong (Zhang, Wanrong.) | Qian, He (Qian, He.)

Indexed by:

CPCI-S

Abstract:

In this paper, the impact of interconnect resistance on 1S1R crossbar array performance is analyzed. Based on elements test results, a crossbar array model is set up considered interconnect resistance. Simulation shows that read margin decreases dramatically when interconnect resistance is too large to keep selector at ON-state, especially under floating scheme. When interconnect resistance is larger than 6 Omega, write margin will drop below 50%, under 1/3 bias scheme. The results show that, the degradation of read margin and write margin caused by interconnect resistance can be suppressed by improving the on/off ratio and low-resistance of selector.

Keyword:

Author Community:

  • [ 1 ] [Li, Yujia]Tsinghua Univ, Inst Microelect, Beijing 100084, Peoples R China
  • [ 2 ] [Gao, Bin]Tsinghua Univ, Inst Microelect, Beijing 100084, Peoples R China
  • [ 3 ] [Wu, Huaqiang]Tsinghua Univ, Inst Microelect, Beijing 100084, Peoples R China
  • [ 4 ] [Qian, He]Tsinghua Univ, Inst Microelect, Beijing 100084, Peoples R China
  • [ 5 ] [Li, Yujia]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 6 ] [Zhang, Wanrong]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China

Reprint Author's Address:

  • [Gao, Bin]Tsinghua Univ, Inst Microelect, Beijing 100084, Peoples R China

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Source :

2019 CHINA SEMICONDUCTOR TECHNOLOGY INTERNATIONAL CONFERENCE (CSTIC)

Year: 2019

Language: English

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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