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Author:

Yu, Haijun (Yu, Haijun.) | Zhang, Zhiyan (Zhang, Zhiyan.) | Wang, Hongyang (Wang, Hongyang.) | Zhao, Shusen (Zhao, Shusen.) | Dong, Zhiyong (Dong, Zhiyong.) | Zou, Chen (Zou, Chen.) | Cao, Kaixuan (Cao, Kaixuan.) | Lin, Xuechun (Lin, Xuechun.)

Indexed by:

EI Scopus SCIE

Abstract:

Pulse laser is an effective tool for removing paint from aircraft and ship surfaces. The analysis of the laser paint removal process requires a synchronous observation method. In this study, based on high-speed shadow imaging technology, an online examination system for laser paint removal was established. The dynamic behaviors of laser paint removal and substrate damages caused by too high laser pulse energy density were analyzed by examining the removal process of epoxy primer on 2A12 Al alloy surface by laser with different energy densities. The results show that when the laser irradiated the sample surface, some plumes, particles and droplets were formed on the material surface. Further analysis reveals that the generation of plumes was due to the ablation of primer, while the particles were generated under thermal stress. When the laser energy density was too high, the substrate materials melted to form droplets. The plumes generated by laser ablation created an extremely high recoil pressure, under which the particles and droplets were detached from the surface of the material.

Keyword:

Laser cleaning Plume Dynamic behavior Mechanism Shadow imaging

Author Community:

  • [ 1 ] [Yu, Haijun]Chinese Acad Sci, Inst Semicond, Lab All Solid State Light Sources, Beijing 100083, Peoples R China
  • [ 2 ] [Zhang, Zhiyan]Chinese Acad Sci, Inst Semicond, Lab All Solid State Light Sources, Beijing 100083, Peoples R China
  • [ 3 ] [Wang, Hongyang]Chinese Acad Sci, Inst Semicond, Lab All Solid State Light Sources, Beijing 100083, Peoples R China
  • [ 4 ] [Zhao, Shusen]Chinese Acad Sci, Inst Semicond, Lab All Solid State Light Sources, Beijing 100083, Peoples R China
  • [ 5 ] [Dong, Zhiyong]Chinese Acad Sci, Inst Semicond, Lab All Solid State Light Sources, Beijing 100083, Peoples R China
  • [ 6 ] [Zou, Chen]Chinese Acad Sci, Inst Semicond, Lab All Solid State Light Sources, Beijing 100083, Peoples R China
  • [ 7 ] [Cao, Kaixuan]Chinese Acad Sci, Inst Semicond, Lab All Solid State Light Sources, Beijing 100083, Peoples R China
  • [ 8 ] [Lin, Xuechun]Chinese Acad Sci, Inst Semicond, Lab All Solid State Light Sources, Beijing 100083, Peoples R China
  • [ 9 ] [Yu, Haijun]Univ Chinese Acad Sci, Coll Mat Sci & Opto Elect Technol, Beijing 100049, Peoples R China
  • [ 10 ] [Wang, Hongyang]Univ Chinese Acad Sci, Coll Mat Sci & Opto Elect Technol, Beijing 100049, Peoples R China
  • [ 11 ] [Lin, Xuechun]Univ Chinese Acad Sci, Coll Mat Sci & Opto Elect Technol, Beijing 100049, Peoples R China
  • [ 12 ] [Zou, Chen]Beijing Univ Technol, Beijing 100124, Peoples R China
  • [ 13 ] [Cao, Kaixuan]Beijing Univ Technol, Beijing 100124, Peoples R China

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Source :

OPTICS AND LASER TECHNOLOGY

ISSN: 0030-3992

Year: 2023

Volume: 163

5 . 0 0 0

JCR@2022

ESI Discipline: ENGINEERING;

ESI HC Threshold:19

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 11

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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