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Author:

Zhou, Xintian (Zhou, Xintian.) | Tang, Yun (Tang, Yun.) | Jia, Yunpeng (Jia, Yunpeng.) | Hu, Dongqing (Hu, Dongqing.) | Wu, Yu (Wu, Yu.) | Xia, Tian (Xia, Tian.) | Gong, Hao (Gong, Hao.) | Pang, Haoyang (Pang, Haoyang.)

Indexed by:

EI Scopus SCIE

Abstract:

Single-event effects (SEEs) in a 650-V state-of-the-art SiC double-trench MOSFET (DT-MOS) are investigated using the Sentaurus TCAD tools. The safe operation areas (SOAs) for single-event burnout (SEB) and single-event gate rupture (SEGR) are extracted when heavy ions with different linear energy transfer (LET) impact the sensitive regions of the device. The results show that the radiation performance of the SiC DT-MOS is poor because of the very low threshold voltages of failures at a high LET range. Moreover, hardening measures, such as introducing a buffer layer and adjusting the mesa width, are discussed to assess their versatility. It is demonstrated that in contrast, the SEGR problem is more severe due to the intrinsic properties of SiC devices. Therefore, it becomes a crucial issue to find ways more suitable for the SiC DT-MOS to avoid gate oxide pre-breakdown, before they could serve as a replacement of Si counterparts in space applications.

Keyword:

single-event gate rupture (SEGR) single-event effects (SEEs) single-event burnout (SEB) SiC double-trench MOSFET (SiC DT-MOS) Hardening solutions

Author Community:

  • [ 1 ] [Zhou, Xintian]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 2 ] [Tang, Yun]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 3 ] [Jia, Yunpeng]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 4 ] [Hu, Dongqing]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 5 ] [Wu, Yu]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 6 ] [Xia, Tian]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 7 ] [Gong, Hao]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 8 ] [Pang, Haoyang]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China

Reprint Author's Address:

  • [Jia, Yunpeng]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China

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Source :

IEEE TRANSACTIONS ON NUCLEAR SCIENCE

ISSN: 0018-9499

Year: 2019

Issue: 11

Volume: 66

Page: 2312-2318

1 . 8 0 0

JCR@2022

ESI Discipline: PHYSICS;

ESI HC Threshold:123

Cited Count:

WoS CC Cited Count: 38

SCOPUS Cited Count: 48

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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