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Author:

Hassan, Ali (Hassan, Ali.) | Iqbal, Muhammad Faisal (Iqbal, Muhammad Faisal.) | Maksym, Stetsenko (Maksym, Stetsenko.) | Tetiana, Margitych (Tetiana, Margitych.) | Azam, Muhammad (Azam, Muhammad.) | Kanwal, Zarfishan (Kanwal, Zarfishan.) | Irfan, Iqra (Irfan, Iqra.) | Li, Baikui (Li, Baikui.) | Jiang, Yijian (Jiang, Yijian.) (Scholars:蒋毅坚)

Indexed by:

EI Scopus SCIE

Abstract:

We presented the experimental and theoretical investigations of the surface plasmon-exciton coupled photoluminescence characteristics of Ga-doped Zinc Oxide (GZO) in Ag/GZO and Au/GZO nanostructures. An eightfold enhancement of the near-band-edge (NBE) emission with suppression of deep levels has been achieved without insertion of a dielectric spacer. The suppression of deep level emission makes these nanostructures useful for visible blind photodetectors. The experimental room temperature photoluminescence consequences pointed that the plasmon-exciton coupling contributed to the enhancement of the radiative recombination rate at the NBE in the metal-semiconductor architecture.

Keyword:

Author Community:

  • [ 1 ] [Hassan, Ali]Shenzhen Univ, Coll Phys & Optoelect Engn, Key Lab Optoelect Devices & Syst Guangdong Prov, Shenzhen 518060, Guangdong, Peoples R China
  • [ 2 ] [Maksym, Stetsenko]Shenzhen Univ, Coll Phys & Optoelect Engn, Key Lab Optoelect Devices & Syst Guangdong Prov, Shenzhen 518060, Guangdong, Peoples R China
  • [ 3 ] [Tetiana, Margitych]Shenzhen Univ, Coll Phys & Optoelect Engn, Key Lab Optoelect Devices & Syst Guangdong Prov, Shenzhen 518060, Guangdong, Peoples R China
  • [ 4 ] [Kanwal, Zarfishan]Shenzhen Univ, Coll Phys & Optoelect Engn, Key Lab Optoelect Devices & Syst Guangdong Prov, Shenzhen 518060, Guangdong, Peoples R China
  • [ 5 ] [Irfan, Iqra]Shenzhen Univ, Coll Phys & Optoelect Engn, Key Lab Optoelect Devices & Syst Guangdong Prov, Shenzhen 518060, Guangdong, Peoples R China
  • [ 6 ] [Li, Baikui]Shenzhen Univ, Coll Phys & Optoelect Engn, Key Lab Optoelect Devices & Syst Guangdong Prov, Shenzhen 518060, Guangdong, Peoples R China
  • [ 7 ] [Hassan, Ali]Shenzhen Univ, Coll Phys & Optoelect Engn, Minist Educ, Shenzhen 518060, Guangdong, Peoples R China
  • [ 8 ] [Maksym, Stetsenko]Shenzhen Univ, Coll Phys & Optoelect Engn, Minist Educ, Shenzhen 518060, Guangdong, Peoples R China
  • [ 9 ] [Tetiana, Margitych]Shenzhen Univ, Coll Phys & Optoelect Engn, Minist Educ, Shenzhen 518060, Guangdong, Peoples R China
  • [ 10 ] [Kanwal, Zarfishan]Shenzhen Univ, Coll Phys & Optoelect Engn, Minist Educ, Shenzhen 518060, Guangdong, Peoples R China
  • [ 11 ] [Irfan, Iqra]Shenzhen Univ, Coll Phys & Optoelect Engn, Minist Educ, Shenzhen 518060, Guangdong, Peoples R China
  • [ 12 ] [Li, Baikui]Shenzhen Univ, Coll Phys & Optoelect Engn, Minist Educ, Shenzhen 518060, Guangdong, Peoples R China
  • [ 13 ] [Hassan, Ali]Beijing Univ Technol, Insitute Laser Engn, Beijing 100124, Peoples R China
  • [ 14 ] [Jiang, Yijian]Beijing Univ Technol, Insitute Laser Engn, Beijing 100124, Peoples R China
  • [ 15 ] [Iqbal, Muhammad Faisal]Univ Sci & Technol China, Hefei Natl Lab Phys Sci Microscale, Hefei 230026, Anhui, Peoples R China
  • [ 16 ] [Maksym, Stetsenko]NAS Ukraine, V Lashkaryov Inst Semicond Phys, UA-03680 Kiev, Ukraine
  • [ 17 ] [Tetiana, Margitych]NAS Ukraine, Kiev Inst Nucl Res, UA-03680 Kiev, Ukraine
  • [ 18 ] [Azam, Muhammad]Shenzhen Univ, Coll Phys & Optoelect Engn, Shenzhen Key Lab Adv Thin Films & Applicat, Shenzhen 518060, Peoples R China

Reprint Author's Address:

  • [Hassan, Ali]Shenzhen Univ, Coll Phys & Optoelect Engn, Key Lab Optoelect Devices & Syst Guangdong Prov, Shenzhen 518060, Guangdong, Peoples R China;;[Hassan, Ali]Shenzhen Univ, Coll Phys & Optoelect Engn, Minist Educ, Shenzhen 518060, Guangdong, Peoples R China;;[Hassan, Ali]Beijing Univ Technol, Insitute Laser Engn, Beijing 100124, Peoples R China

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Source :

JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS

ISSN: 0957-4522

Year: 2019

Issue: 23

Volume: 30

Page: 20544-20550

2 . 8 0 0

JCR@2022

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:211

JCR Journal Grade:2

Cited Count:

WoS CC Cited Count: 8

SCOPUS Cited Count: 8

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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