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Author:

Song, Xubo (Song, Xubo.) | Wang, Yuangang (Wang, Yuangang.) | Feng, Zhihong (Feng, Zhihong.) | Lv, Yuanjie (Lv, Yuanjie.) | Zhang, Yamin (Zhang, Yamin.) | Zhang, Lisen (Zhang, Lisen.) | Liang, Shixiong (Liang, Shixiong.) | Tan, Xin (Tan, Xin.) | Dun, Shaobo (Dun, Shaobo.) | Yang, Dabao (Yang, Dabao.) | Zhang, Zhirong (Zhang, Zhirong.)

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EI

Abstract:

We presented a GaN Schottky diode model with consideration of self-heating effect of devices in operation. The impact of diode chip temperature on the current and capacitance was taken into account in this model. The thermal resistance of diode chip was extracted by simulation combined measurement to calculate the temperature of Schottky junction with different pumping power. Advantages of established device model in the design of a 220GHz frequency doubler were presented in the end. © 2019 IEEE.

Keyword:

III-V semiconductors Gallium nitride Models Diodes Schottky barrier diodes

Author Community:

  • [ 1 ] [Song, Xubo]National Key Laboratory of ASIC, Hebei Semiconductor Research Institude, Shijiazhuang, China
  • [ 2 ] [Wang, Yuangang]National Key Laboratory of ASIC, Hebei Semiconductor Research Institude, Shijiazhuang, China
  • [ 3 ] [Feng, Zhihong]National Key Laboratory of ASIC, Hebei Semiconductor Research Institude, Shijiazhuang, China
  • [ 4 ] [Lv, Yuanjie]National Key Laboratory of ASIC, Hebei Semiconductor Research Institude, Shijiazhuang, China
  • [ 5 ] [Zhang, Yamin]Laboratory of Semiconductor Device Reliability Physics, Beijing University of Technology, Beijing, China
  • [ 6 ] [Zhang, Lisen]National Key Laboratory of ASIC, Hebei Semiconductor Research Institude, Shijiazhuang, China
  • [ 7 ] [Liang, Shixiong]National Key Laboratory of ASIC, Hebei Semiconductor Research Institude, Shijiazhuang, China
  • [ 8 ] [Tan, Xin]National Key Laboratory of ASIC, Hebei Semiconductor Research Institude, Shijiazhuang, China
  • [ 9 ] [Dun, Shaobo]National Key Laboratory of ASIC, Hebei Semiconductor Research Institude, Shijiazhuang, China
  • [ 10 ] [Yang, Dabao]National Key Laboratory of ASIC, Hebei Semiconductor Research Institude, Shijiazhuang, China
  • [ 11 ] [Zhang, Zhirong]National Key Laboratory of ASIC, Hebei Semiconductor Research Institude, Shijiazhuang, China

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ISSN: 2162-7541

Year: 2019

Language: English

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 3

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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