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Author:

Zhu, Hui (Zhu, Hui.) | Yang, Ying (Yang, Ying.) | Meng, Xiao (Meng, Xiao.) | Jiang, Anquan (Jiang, Anquan.) | Bai, Zilong (Bai, Zilong.) | Zheng, Xiang (Zheng, Xiang.) | Jin, Lei (Jin, Lei.) | Wang, Chen (Wang, Chen.) | Feng, Shiwei (Feng, Shiwei.) (Scholars:冯士维)

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EI Scopus SCIE

Abstract:

We present a method to study the trap characteristics in BiFeO3 thin films, which display a resistance switching effect caused by trapping/detrapping of charge carriers. The method consists of measuring the current transients for the detrapping of charge carriers from trap sites and subsequent analysis of the time constant from the current transient curve. Using this method, the energy level of the traps was identified to be 0.71 +/- 0.06 eV. The parameters of the trapping pulses (voltage and time duration) were found to affect the time constant, indicating a close relationship between the escape frequency of the charge carriers and the structure ordering caused by polarization and the filling of the traps. Published by AIP Publishing.

Keyword:

Author Community:

  • [ 1 ] [Zhu, Hui]Beijing Univ Technol, Sch Microelect, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 2 ] [Yang, Ying]Beijing Univ Technol, Sch Microelect, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 3 ] [Meng, Xiao]Beijing Univ Technol, Sch Microelect, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 4 ] [Zheng, Xiang]Beijing Univ Technol, Sch Microelect, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 5 ] [Jin, Lei]Beijing Univ Technol, Sch Microelect, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 6 ] [Wang, Chen]Beijing Univ Technol, Sch Microelect, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 7 ] [Feng, Shiwei]Beijing Univ Technol, Sch Microelect, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 8 ] [Jiang, Anquan]Fudan Univ, Coll Microelect, Shanghai 200433, Peoples R China
  • [ 9 ] [Bai, Zilong]Fudan Univ, Coll Microelect, Shanghai 200433, Peoples R China

Reprint Author's Address:

  • [Zhu, Hui]Beijing Univ Technol, Sch Microelect, Fac Informat Technol, Beijing 100124, Peoples R China

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Source :

APPLIED PHYSICS LETTERS

ISSN: 0003-6951

Year: 2018

Issue: 18

Volume: 112

4 . 0 0 0

JCR@2022

ESI Discipline: PHYSICS;

ESI HC Threshold:145

JCR Journal Grade:1

Cited Count:

WoS CC Cited Count: 14

SCOPUS Cited Count: 15

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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