The　crystalline　titanium　films　on　conductive　glass　(FTO)　with　columnar　structure　were　prepared　by　using　DC　magnetron　sputtering　approach　in　this　paper.　The　influences　of　the　sputtering　current　and　substrate　temperature　on　microstructure　of　titanium　films　were　investigated.　The　impacts　of　columnar　crystalline　structure　on　the　structural　morphology　of　TiO2　nanotubes　via　anodization　were　also　analysised.　The　morphology　and　structure　of　the　samples　were　identified　by　means　of　field　emission　scanning　electron　microscope　(FE-SEM)　and　X-ray　diffractometry　(XRD).　It　is　found　that,　with　the　sputtering　current　increasing,　the　grain　size　of　titanium　film　increases,　but　the　denseness　increases　at　first,　and　then　decreases.　Both　grain　size　and　the　denseness　of　titanium　films　increase　with　the　temperature　from　300°C　to　450°C,　and　the　columnar　structure　become　more　uniform.　The　anodization　process　is　applied　to　the　sputter-deposited　titanium　film　and　the　results　show　that　titanium　films　which　have　compact　columnar　crystalline　structure　are　benefitial　for　the　growth　of　TiO2　nanotubes.