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Author:

Huang, Youwen (Huang, Youwen.) | Zhang, Xing (Zhang, Xing.) | Zhang, Jianwei (Zhang, Jianwei.) (Scholars:张建伟) | Xie, Yiyang (Xie, Yiyang.) | Hofmann, Werner (Hofmann, Werner.) | Ning, Yongqiang (Ning, Yongqiang.) | Wang, Lijun (Wang, Lijun.)

Indexed by:

EI Scopus SCIE

Abstract:

In this paper, we report on high beam quality vertical-cavity surface-emitting lasers (VCSELs) featuring a monolithically integrated aspherical microlens. This lens is fabricated by a one-step diffusion-limited wet etch process. VCSELs with microlenses with different curvature radius are designed, fabricated, and characterized, as well as reference VCSEL devices without the microlens. Significant improvement of beam divergence and single-mode performance are demonstrated in microlens VCSELs. The divergence angles of a conventional VCSEL are 14.5 degrees, 16.0 degrees, and 17.0 degrees (full width at D4 sigma) at 2 mA, 3 mA, and 4 mA, respectively, with a M-2 value measured to be 6.9 at 3 mA. Under the same current injection, the divergence angles of a comparable VCSEL with a micro-lens (curvature radius of 31.8 mu m) are reduced to 4.8 degrees, 5.5 degrees, and 5.7 degrees, respectively. The M-2 value of the lensed VCSEL is as low as 1.9 at 3 mA.

Keyword:

Semiconductor laser VCSEL high beam quality wet-etching micro-lens

Author Community:

  • [ 1 ] [Huang, Youwen]Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, State Key Lab Luminescence & Applicat, Changchun 130033, Jilin, Peoples R China
  • [ 2 ] [Zhang, Xing]Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, State Key Lab Luminescence & Applicat, Changchun 130033, Jilin, Peoples R China
  • [ 3 ] [Zhang, Jianwei]Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, State Key Lab Luminescence & Applicat, Changchun 130033, Jilin, Peoples R China
  • [ 4 ] [Ning, Yongqiang]Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, State Key Lab Luminescence & Applicat, Changchun 130033, Jilin, Peoples R China
  • [ 5 ] [Wang, Lijun]Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, State Key Lab Luminescence & Applicat, Changchun 130033, Jilin, Peoples R China
  • [ 6 ] [Huang, Youwen]Univ Chinese Acad Sci, Beijing 100049, Peoples R China
  • [ 7 ] [Xie, Yiyang]Beijing Univ Technol, Beijing 100124, Peoples R China
  • [ 8 ] [Hofmann, Werner]Tech Univ Berlin, Sch Solid State Phys, D-10623 Berlin, Germany

Reprint Author's Address:

  • [Zhang, Xing]Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, State Key Lab Luminescence & Applicat, Changchun 130033, Jilin, Peoples R China

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Source :

IEEE PHOTONICS JOURNAL

ISSN: 1943-0655

Year: 2017

Issue: 4

Volume: 9

2 . 4 0 0

JCR@2022

ESI Discipline: PHYSICS;

ESI HC Threshold:158

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count: 3

SCOPUS Cited Count: 5

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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