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Author:

Li, L. (Li, L..) | Shen, G.-D. (Shen, G.-D..) | Zou, D.-S. (Zou, D.-S..) | Liu, Z. (Liu, Z..) | Deng, J. (Deng, J..) | Yang, D.-H. (Yang, D.-H..) | Wu, J.-M. (Wu, J.-M..)

Indexed by:

Scopus PKU CSCD

Abstract:

A room temperature IR detector is designed by using the principle of IR absorption gas directly absorbing IR radiation. After the gas within a closely sealed cavity absorbs IR radiation, the enlarged pressure intensity within the cavity makes the thin film deform. The size of IR radiation can be measured from the capacitive variation quantity of a micro-capacitance which uses the elastic thin film as movable polar plate. The detector made with MEMS technology is sensitive for 8 - 14 μm IR radiation and its sensitivity ≥ 2 × 10-3 pF/mW.

Keyword:

Elastic sensitive film; Infrared absorption gas; Infrared detector; Micromachine

Author Community:

  • [ 1 ] [Li, L.]Beijing Optoelectron. Technol. Lab., Sch. of Electron. Info., Beijing Univ. of Technology, Beijing 100022, China
  • [ 2 ] [Shen, G.-D.]Beijing Optoelectron. Technol. Lab., Sch. of Electron. Info., Beijing Univ. of Technology, Beijing 100022, China
  • [ 3 ] [Zou, D.-S.]Beijing Optoelectron. Technol. Lab., Sch. of Electron. Info., Beijing Univ. of Technology, Beijing 100022, China
  • [ 4 ] [Liu, Z.]Beijing Optoelectron. Technol. Lab., Sch. of Electron. Info., Beijing Univ. of Technology, Beijing 100022, China
  • [ 5 ] [Deng, J.]Beijing Optoelectron. Technol. Lab., Sch. of Electron. Info., Beijing Univ. of Technology, Beijing 100022, China
  • [ 6 ] [Yang, D.-H.]Beijing Optoelectron. Technol. Lab., Sch. of Electron. Info., Beijing Univ. of Technology, Beijing 100022, China
  • [ 7 ] [Wu, J.-M.]Beijing Optoelectron. Technol. Lab., Sch. of Electron. Info., Beijing Univ. of Technology, Beijing 100022, China

Reprint Author's Address:

  • [Li, L.]Beijing Optoelectron. Technol. Lab., Sch. of Electron. Info., Beijing Univ. of Technology, Beijing 100022, China

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Source :

Opto-Electronic Engineering

ISSN: 1003-501X

Year: 2004

Issue: 2

Volume: 31

Page: 34-36,43

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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