A　microlens　with　a　specific　size　is　fabricated　by　using　melting　photoresist,　and　the　microlens　can　be　applied　to　a　shortwave　1　μm　~　3　μm　infrared　detector,　which　can　effectively　improve　the　photoelectric　performance　of　the　detector.　Using　AZP4620　thick　photoresist　and　UV　lithography　technology,　the　lens　production　in　the　soft　bake,　exposure　and　development,　hardening,　hot　melt　and　other　processes　were　carried　out　in-depth　and　detailed　experimental　study　was　done　to　determine　the　optimal　process　parameters.　The　micro-lens　with　a　crown　diameter　of　(5.5　±　0.5)　μm　and　a　radius　of　curvature　of　3　μm　was　realized.　The　lens　has　good　uniformity　and　consistency　to　meet　the　requirements　of　near　infrared　detection　device.　©　2017,　Editorial　Office　of　Opto-Electronic　Engineering.　All　right　reserved.