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作者:

Wei, H. (Wei, H..) | Deng, Z. (Deng, Z..) | Guo, X. (Guo, X..) (学者:郭霞) | Wang, Y. (Wang, Y..) | Yang, H. (Yang, H..) (学者:杨宏)

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Scopus

摘要:

In this paper, high on/off capacitance ratio radio frequency micro-electro-mechanical-systems (RF MEMS) switches are designed, fabricated, measured and analyzed. Two types of RF MEMS switches, a shunt switch with a contact point and an inline switch without a contact point, are presented. Metal-insulator-metal (MIM) fixed capacitors are used in the MEMS switches. The electrode topologies of RF MEMS switches are analyzed. The parameter λ is defined to describe the relationship between the capacitance ratio, the height of the beam and the actuation voltage. The measured results indicate that, for MEMS switch #1 with a contact point and gap of 1 μm, the insertion loss is better than 0.64 dB up to 40 GHz, and the isolation is more than 20 dB from 11.28 to 30.38 GHz with an actuation voltage of 42 V. For the inline MEMS with a displacement of 1.5 μm, the insertion loss is better than 0.56 dB up to 40 GHz, and the isolation is more than 20 dB from 4.45 to 30.48 GHz with an actuation voltage of 36 V. Circuit models and measured results of the proposed MEMS switches show good agreement. From the fitted results, the on/off capacitance ratio is ∼227 for the MEMS switch #1 and ∼313 for the MEMS switch #2, respectively. Compared with traditional MEMS capacitive switches with dielectric material Si3N4 and a relatively lower gap (1.5 μm), the proposed MEMS switches exhibit high on/off capacitance ratios. © 2017 IOP Publishing Ltd.

关键词:

coplanar waveguide; high isolation MEMS switch; high on/off capacitance ratio; RF MEMS capacitive switch

作者机构:

  • [ 1 ] [Wei, H.]School of Electronic Engineering, Beijing University of Posts and Telecommunications, Beijing, CO 100876, China
  • [ 2 ] [Deng, Z.]School of Electronic Engineering, Beijing University of Posts and Telecommunications, Beijing, CO 100876, China
  • [ 3 ] [Guo, X.]School of Electronic Engineering, Beijing University of Posts and Telecommunications, Beijing, CO 100876, China
  • [ 4 ] [Wang, Y.]School of Electronic Engineering, Beijing University of Posts and Telecommunications, Beijing, CO 100876, China
  • [ 5 ] [Yang, H.]Information Engineering Department, Beijing Polytechnic College, Beijing, CO 100042, China

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来源 :

Journal of Micromechanics and Microengineering

ISSN: 0960-1317

年份: 2017

期: 5

卷: 27

2 . 3 0 0

JCR@2022

ESI学科: ENGINEERING;

ESI高被引阀值:92

中科院分区:3

被引次数:

WoS核心集被引频次: 0

SCOPUS被引频次: 20

ESI高被引论文在榜: 0 展开所有

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