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作者:

Zheng, Xiang (Zheng, Xiang.) | Feng, Shiwei (Feng, Shiwei.) (学者:冯士维) | Zhang, Yamin (Zhang, Yamin.) | Yang, Junwei (Yang, Junwei.)

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摘要:

Time constant spectra are extracted from current transients based on the Bayesian deconvolution and used to characterize traps in GaN high-electron mobility transistors. Two kinds of traps with different time constants in an actual device were identified in the AIGaN barrier layer and the GaN layer, respectively. In particular, the trapping process in the AIGaN barrier layer was identified at the region near the drain side under gate contact. Trapping mechanisms of both two traps are discussed. Additionally, we observe that the trap in the AlGaN barrier layer requires sufficient electric field to activate the trapping process and a high drain voltage (V-ds) accelerates the trapping processes both in the AIGaN barrier layer and the GaN,layer. In addition, detrapping experiments with different filling conditions were performed to confirm their spatial positions. The influence of self-heating is excluded during the experiment by keeping the power density at a very low level, and the trapping effect is the sole factor accounting for the current transients. (C) 2016 Elsevier Ltd. All rights reserved.

关键词:

Current transients GaN High-electron mobility transistors (HEMTs) Time constant spectrum Trapping effect

作者机构:

  • [ 1 ] [Zheng, Xiang]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 2 ] [Feng, Shiwei]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 3 ] [Zhang, Yamin]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 4 ] [Yang, Junwei]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China

通讯作者信息:

  • 冯士维

    [Feng, Shiwei]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China

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来源 :

MICROELECTRONICS RELIABILITY

ISSN: 0026-2714

年份: 2016

卷: 63

页码: 46-51

1 . 6 0 0

JCR@2022

ESI学科: ENGINEERING;

ESI高被引阀值:102

中科院分区:4

被引次数:

WoS核心集被引频次: 18

SCOPUS被引频次: 25

ESI高被引论文在榜: 0 展开所有

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