A　highly　efficient　approach　for　reducing　the　reflection　of　the　black　silicon　surface　is　demonstrated,　in　which　the　black　silicon　is　fabricated　in　alkaline　solution　via　a　femtosecond　laser　irradiation.　The　junglelike　microstructures　are　formed　on　the　surface　of　the　black　silicon.　Compared　to　the　polished　silicon,　the　black　silicon　can　significantly　suppress　the　surface　reflection.　Throughout　the　region　of　visible　light,　the　average　minimum　reflectance　of　the　blackened　surface　is　about　5.6%.　Meanwhile,　in　order　to　get　an　optimal　laser　energy,　we　investigated　the　evolution　on　silicon　surface　as　a　function　of　incident　pulse　energy.　Taking　into　account　the　height　of　junglelike　microstructures　and　the　reflectance　of　black　silicon　samples,　the　optimal　laser　energy　is　1400　mu　J.　By　choosing　the　right　laser　energy,　it　is　possible　to　fabricate　the　highly　absorptive　black　silicon.　These　results　are　of　extreme　importance　in　the　control　of　surface　morphology　and　the　modification　of　material　surface.　(C)　2015　Laser　Institute　of　America.