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作者:

Wang, Chuanshou (Wang, Chuanshou.) | Ke, Xiaoxing (Ke, Xiaoxing.) | Wang, Jianjun (Wang, Jianjun.) | Liang, Renrong (Liang, Renrong.) | Luo, Zhenlin (Luo, Zhenlin.) | Tian, Yu (Tian, Yu.) | Yi, Di (Yi, Di.) | Zhang, Qintong (Zhang, Qintong.) | Wang, Jing (Wang, Jing.) | Han, Xiu-Feng (Han, Xiu-Feng.) | Van Tendeloo, Gustaaf (Van Tendeloo, Gustaaf.) | Chen, Long-Qing (Chen, Long-Qing.) | Nan, Ce-Wen (Nan, Ce-Wen.) | Ramesh, Ramamoorthy (Ramesh, Ramamoorthy.) | Zhang, Jinxing (Zhang, Jinxing.)

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摘要:

A controllable ferroelastic switching in ferroelectric/multiferroic oxides is highly desirable due to the non-volatile strain and possible coupling between lattice and other order parameter in heterostructures. However, a substrate clamping usually inhibits their elastic deformation in thin films without micro/nano-patterned structure so that the integration of the non-volatile strain with thin film devices is challenging. Here, we report that reversible in-plane elastic switching with a non-volatile strain of approximately 0.4% can be achieved in layered-perovskite Bi2WO6 thin films, where the ferroelectric polarization rotates by 90 degrees within four in-plane preferred orientations. Phase-field simulation indicates that the energy barrier of ferroelastic switching in orthorhombic Bi2WO6 film is ten times lower than the one in PbTiO3 films, revealing the origin of the switching with negligible substrate constraint. The reversible control of the in-plane strain in this layered-perovskite thin film demonstrates a new pathway to integrate mechanical deformation with nanoscale electronic and/or magnetoelectronic applications.

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作者机构:

  • [ 1 ] [Wang, Chuanshou]Beijing Normal Univ, Dept Phys, Beijing 100875, Peoples R China
  • [ 2 ] [Tian, Yu]Beijing Normal Univ, Dept Phys, Beijing 100875, Peoples R China
  • [ 3 ] [Wang, Jing]Beijing Normal Univ, Dept Phys, Beijing 100875, Peoples R China
  • [ 4 ] [Zhang, Jinxing]Beijing Normal Univ, Dept Phys, Beijing 100875, Peoples R China
  • [ 5 ] [Ke, Xiaoxing]Univ Antwerp, EMAT Electron Microscopy Mat Sci, Groenenborgerlaan 171, B-2020 Antwerp, Belgium
  • [ 6 ] [Van Tendeloo, Gustaaf]Univ Antwerp, EMAT Electron Microscopy Mat Sci, Groenenborgerlaan 171, B-2020 Antwerp, Belgium
  • [ 7 ] [Ke, Xiaoxing]Beijing Univ Technol, Inst Microstruct & Properties Adv Mat, Beijing 100124, Peoples R China
  • [ 8 ] [Wang, Jianjun]Tsinghua Univ, Sch Mat Sci & Engn, State Key Lab New Ceram & Fine Proc, Beijing 100084, Peoples R China
  • [ 9 ] [Chen, Long-Qing]Tsinghua Univ, Sch Mat Sci & Engn, State Key Lab New Ceram & Fine Proc, Beijing 100084, Peoples R China
  • [ 10 ] [Nan, Ce-Wen]Tsinghua Univ, Sch Mat Sci & Engn, State Key Lab New Ceram & Fine Proc, Beijing 100084, Peoples R China
  • [ 11 ] [Liang, Renrong]Tsinghua Univ, Inst Microelect, Tsinghua Natl Lab Informat Sci & Technol, Beijing 100084, Peoples R China
  • [ 12 ] [Luo, Zhenlin]Univ Sci & Technol China, Natl Synchrotron Radiat Lab, Hefei 230026, Peoples R China
  • [ 13 ] [Luo, Zhenlin]Univ Sci & Technol China, CAS Key Lab Mat Energy Convers, Hefei 230026, Peoples R China
  • [ 14 ] [Yi, Di]Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
  • [ 15 ] [Ramesh, Ramamoorthy]Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
  • [ 16 ] [Zhang, Qintong]Chinese Acad Sci, Inst Phys, Beijing Natl Lab Condensed Matter Phys, Beijing 100190, Peoples R China
  • [ 17 ] [Han, Xiu-Feng]Chinese Acad Sci, Inst Phys, Beijing Natl Lab Condensed Matter Phys, Beijing 100190, Peoples R China
  • [ 18 ] [Chen, Long-Qing]Penn State Univ, Dept Mat Sci & Engn, University Pk, PA 16802 USA

通讯作者信息:

  • [Zhang, Jinxing]Beijing Normal Univ, Dept Phys, Beijing 100875, Peoples R China;;[Nan, Ce-Wen]Tsinghua Univ, Sch Mat Sci & Engn, State Key Lab New Ceram & Fine Proc, Beijing 100084, Peoples R China;;[Ramesh, Ramamoorthy]Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA

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来源 :

NATURE COMMUNICATIONS

ISSN: 2041-1723

年份: 2016

卷: 7

1 6 . 6 0 0

JCR@2022

ESI学科: Multidisciplinary;

ESI高被引阀值:214

中科院分区:1

被引次数:

WoS核心集被引频次: 98

SCOPUS被引频次: 110

ESI高被引论文在榜: 0 展开所有

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中文被引频次:

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