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作者:

Ma, Limin (Ma, Limin.) | Zuo, Yong (Zuo, Yong.) | Liu, Sihan (Liu, Sihan.) | Guo, Fu (Guo, Fu.) (学者:郭福)

收录:

SCIE

摘要:

Whisker formation is a frequently occurring problem in the electronica industry, causing damage to fine-pitch electrical components. Several theories and models have been developed to describe the whisker growth, and many attempts have been made to find solutions for this issue. Most of the previous literature addressed the formation of Sn whiskers, while some attention was focused on Bi-rich whiskers. Moreover, investigation of different types of whiskers would be beneficial for understanding of the fundamental processes behind of the whisker growth. In our work, we analyze and discuss the growth of Bi-rich whiskers in eutectic Sn58Bi solder coatings under isothermal aging conditions. A possible growth mechanism for Bi-whiskers in the coating is proposed. Two processes contributed to the whisker growth. One process was the chemical reaction between Cu and Sn atoms to form Cu6Sn5. Cu atoms were inexhaustibly introduced into the coating from the substrate and caused the formation of Cu6Sn5. This process provided the driving force and was a sufficient condition for the growth of Bi-rich whiskers. The second process was the segregation of Bi atoms driven by the gradient of the Bi atoms' concentration. This process was the necessary condition for Bi-whiskers growth.

关键词:

bi-rich whisker Cu6Sn5 isothermal aging Sn58Bi coating

作者机构:

  • [ 1 ] [Ma, Limin]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 2 ] [Zuo, Yong]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 3 ] [Liu, Sihan]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 4 ] [Guo, Fu]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China

通讯作者信息:

  • [Ma, Limin]Beijing Univ Technol, Coll Mat Sci & Engn, 100 Ping Le Yuan, Beijing 100124, Peoples R China

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来源 :

JOURNAL OF ELECTRONIC MATERIALS

ISSN: 0361-5235

年份: 2016

期: 1

卷: 45

页码: 44-50

2 . 1 0 0

JCR@2022

ESI学科: MATERIALS SCIENCE;

ESI高被引阀值:198

中科院分区:4

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WoS核心集被引频次: 4

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