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作者:

Bai, N. (Bai, N..) | Liu, F. R. (Liu, F. R..) (学者:刘富荣) | Han, X. X. (Han, X. X..) | Zhu, Z. (Zhu, Z..) | Liu, F. (Liu, F..) | Lin, X. (Lin, X..) | Sun, N. X. (Sun, N. X..)

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EI Scopus SCIE

摘要:

In this paper, the influence of Sn doping (0%, 8%, and 14%) on the crystallization of Ge2Sb2Te5 (GST) was studied with the aid of an ultraviolet laser. It was found that the addition of Sn element not only expanded the lattice parameter but also decreased the crystallization temperature and activation energy as compared to the GST. As compared to the Ge2Sb2Te5, a more complete crystallization of the Sn doping Ge2Sb2Te5 is mainly due to the lower binding energy of Sn-Te (359.8 kJ/mop, which could be more easily taken part in the bond breakage and formation than Ge-Te (456 kJ/mol) in such a short time as 30 ns. The equiaxial grains were obtained for the Sn5Ge15Sb23Te54 films when crystallization was induced by the laser fluence of 20 mJ/cm(2) but the grains elongated when the laser fluence was increased to 60 mJ/cm2. The reason may be the incorporation of Sn elements changed the crystal nucleation mode. (C) 2015 Elsevier Ltd.

关键词:

Crystallization Sn doping Ultraviolet laser

作者机构:

  • [ 1 ] [Bai, N.]Beijing Univ Technol, Inst Laser Engn, Beijing Engn Res Ctr Appl Laser Technol, Beijing 100124, Peoples R China
  • [ 2 ] [Liu, F. R.]Beijing Univ Technol, Inst Laser Engn, Beijing Engn Res Ctr Appl Laser Technol, Beijing 100124, Peoples R China
  • [ 3 ] [Han, X. X.]Beijing Univ Technol, Inst Laser Engn, Beijing Engn Res Ctr Appl Laser Technol, Beijing 100124, Peoples R China
  • [ 4 ] [Zhu, Z.]Beijing Univ Technol, Inst Laser Engn, Beijing Engn Res Ctr Appl Laser Technol, Beijing 100124, Peoples R China
  • [ 5 ] [Liu, F.]Northwestern Polytech Univ, State Key Lab Solidificat Proc, Xian, Shaanxi, Peoples R China
  • [ 6 ] [Lin, X.]Northwestern Polytech Univ, State Key Lab Solidificat Proc, Xian, Shaanxi, Peoples R China
  • [ 7 ] [Sun, N. X.]Northeastern Univ, Dept Elect & Comp Engn, Boston, MA 02115 USA

通讯作者信息:

  • 刘富荣

    [Liu, F. R.]Beijing Univ Technol, Inst Laser Engn, Beijing Engn Res Ctr Appl Laser Technol, Beijing 100124, Peoples R China

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来源 :

OPTICS AND LASER TECHNOLOGY

ISSN: 0030-3992

年份: 2015

卷: 74

页码: 11-15

5 . 0 0 0

JCR@2022

ESI学科: ENGINEERING;

ESI高被引阀值:114

JCR分区:2

中科院分区:3

被引次数:

WoS核心集被引频次: 10

SCOPUS被引频次: 11

ESI高被引论文在榜: 0 展开所有

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中文被引频次:

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