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作者:

Panezai, Spozmai (Panezai, Spozmai.) | Wang, Dayong (Wang, Dayong.) (学者:王大勇) | Zhao, Jie (Zhao, Jie.) | Wang, Yunxin (Wang, Yunxin.) (学者:王云新) | Rong, Lu (Rong, Lu.) (学者:戎路) | Ma, Sijin (Ma, Sijin.)

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摘要:

The phase-only liquid crystal on silicon (LCOS) spatial light modulator has been used as a wavefront generator and reconstruction device for display applications due to its phase-only modulating property of incident light. In order to achieve the best reconstructed phase modulated wavefront, the properties of LCOS have to be fully known. The intensity of reflected light from LCOS decreases under normal incidence by going through a beam splitter. In order to improve the intensity of the reflected light beam, the oblique incidence is preferred during many applications. The oblique incidence characterization of a parallel aligned LCOS is investigated at a working wavelength of 532 nm on the basis of double-hole interferometric method. Through experiments, the phase modulation characterization of LCOS under the oblique incidence is obtained. In addition, an image postprocessing method is proposed to overcome the effect of flicker and coherent noise by simplifying the computation and increasing the measurement accuracy. The comparison of experimental results for different incident angles indicates that it plays an important role in the performance of phase modulation of LCOS, where the phase modulation decreases with the increasing angle of incidence. (C) 2015 Society of Photo-Optical Instrumentation Engineers (SPIE)

关键词:

image postprocessing liquid crystal on silicon modulation characterization oblique incidence

作者机构:

  • [ 1 ] [Panezai, Spozmai]Beijing Univ Technol, Coll Appl Sci, Beijing 100124, Peoples R China
  • [ 2 ] [Wang, Dayong]Beijing Univ Technol, Coll Appl Sci, Beijing 100124, Peoples R China
  • [ 3 ] [Wang, Yunxin]Beijing Univ Technol, Coll Appl Sci, Beijing 100124, Peoples R China
  • [ 4 ] [Rong, Lu]Beijing Univ Technol, Coll Appl Sci, Beijing 100124, Peoples R China
  • [ 5 ] [Ma, Sijin]Beijing Univ Technol, Coll Appl Sci, Beijing 100124, Peoples R China
  • [ 6 ] [Zhao, Jie]Beijing Univ Technol, Pilot Coll, Beijing 101101, Peoples R China

通讯作者信息:

  • 王大勇

    [Wang, Dayong]Beijing Univ Technol, Coll Appl Sci, 100 Pingleyuan Rd, Beijing 100124, Peoples R China

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来源 :

OPTICAL ENGINEERING

ISSN: 0091-3286

年份: 2015

期: 3

卷: 54

1 . 3 0 0

JCR@2022

ESI学科: ENGINEERING;

ESI高被引阀值:114

JCR分区:3

中科院分区:4

被引次数:

WoS核心集被引频次: 4

SCOPUS被引频次:

ESI高被引论文在榜: 0 展开所有

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