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作者:

Bai, N. (Bai, N..) | Liu, F. R. (Liu, F. R..) (学者:刘富荣) | Han, X. X. (Han, X. X..) | Zhu, Z. (Zhu, Z..) | Liu, F. (Liu, F..) | Lin, X. (Lin, X..) | Sun, N. X. (Sun, N. X..)

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EI Scopus SCIE

摘要:

In this paper, the influence of Sn doping (0%, 8% and 14%) on the crystallization of Ge2Sb2Te5 was studied with the aid of an ultraviolet laser. The XRD analyses revealed that the addition of Sn maintained the NaCl-type structure of Ge2Sb2Te5 after crystallization but expanded the lattice parameter due to the smaller atomic radii of Ge replaced by Sn. Raman peaks (123, 150 and 110 cm(-1)) moved towards lower wavenumbers (118, 137 and 104 cm(-1)), which can be explained by the remarkable decrease of the binding energy from Ge-Te to Sn-Te. A remarkable increase in optical contrast from 15% to 40% was observed in the Sn-doped Ge2Sb2Te5 film after crystallization with both the isothermal annealing and laser radiance. While the optical contrast changed little for a fixed volume fraction of Sn-doped sample with the variation of laser fluence which is attributed to the crystallization mechanism induced by laser under different fluences is the same. (C) 2014 Elsevier B.V. All rights reserved.

关键词:

Crystallization Ge-Sb-Te Optical contrast Sn doping Ultraviolet laser

作者机构:

  • [ 1 ] [Bai, N.]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 2 ] [Liu, F. R.]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 3 ] [Han, X. X.]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 4 ] [Zhu, Z.]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 5 ] [Liu, F.]Northwestern Polytech Univ, State Key Lab Solidificat Proc, Xian, Peoples R China
  • [ 6 ] [Lin, X.]Northwestern Polytech Univ, State Key Lab Solidificat Proc, Xian, Peoples R China
  • [ 7 ] [Sun, N. X.]Northeastern Univ, Dept Elect & Comp Engn, Boston, MA 02115 USA

通讯作者信息:

  • 刘富荣

    [Liu, F. R.]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China

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来源 :

APPLIED SURFACE SCIENCE

ISSN: 0169-4332

年份: 2014

卷: 316

页码: 202-206

6 . 7 0 0

JCR@2022

ESI学科: MATERIALS SCIENCE;

ESI高被引阀值:256

JCR分区:1

中科院分区:2

被引次数:

WoS核心集被引频次: 20

SCOPUS被引频次: 21

ESI高被引论文在榜: 0 展开所有

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