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作者:

Qiao, Yanbin (Qiao, Yanbin.) | Feng, Shiwei (Feng, Shiwei.) (学者:冯士维) | Zhang, Gongchang (Zhang, Gongchang.) | Xiong, Cong (Xiong, Cong.) | Zhu, Hui (Zhu, Hui.) | Guo, Chunsheng (Guo, Chunsheng.)

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EI Scopus SCIE

摘要:

Thermomechanical cycle failure was analyzed in 808-nm high-power AlGaAs/GaAs laser diode bars (LDBs) in detail. Two thermal stress cycle experiments were carried out in these devices with peak thermal stresses of 19.4 and 33 MPa. The threshold current increase demonstrated a square-root dependence on the cycle number, and a tail and split in lasing spectrum were observed. This result was attributed to nonradiative recombination increasing with cycle number due to the diffusion of defects that accompanies band-structure renormalization. Furthermore, from X-ray diffraction measurements we found that the epitaxial layer remains monocrystalline during thermal stress cycling. We calculated the out-of-plane strain and in-plane stress induced by plastic deformation in the epitaxial layer based on the interplanar spacing in the crystal. Our results suggest that thermomechanical strain and stress were induced by pulsed operation, which led to degradation of the high-power LDBs.

关键词:

thermal stress thermomechanical cycle failure Laser diode bar (LDB) X-ray diffraction (XRD)

作者机构:

  • [ 1 ] [Qiao, Yanbin]Beijing Univ Technol, Sch Elect Informat & Control Engn, Beijing 100124, Peoples R China
  • [ 2 ] [Feng, Shiwei]Beijing Univ Technol, Sch Elect Informat & Control Engn, Beijing 100124, Peoples R China
  • [ 3 ] [Zhu, Hui]Beijing Univ Technol, Sch Elect Informat & Control Engn, Beijing 100124, Peoples R China
  • [ 4 ] [Guo, Chunsheng]Beijing Univ Technol, Sch Elect Informat & Control Engn, Beijing 100124, Peoples R China
  • [ 5 ] [Zhang, Gongchang]Beijing Nari Smart Chip Microelect Technol Co, Beijing 100192, Peoples R China
  • [ 6 ] [Xiong, Cong]Chinese Acad Sci, Inst Semicond, Natl Engn Res Ctr Optoelect Devices, Beijing 100083, Peoples R China

通讯作者信息:

  • [Qiao, Yanbin]Beijing Univ Technol, Sch Elect Informat & Control Engn, Beijing 100124, Peoples R China

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来源 :

IEEE TRANSACTIONS ON ELECTRON DEVICES

ISSN: 0018-9383

年份: 2014

期: 8

卷: 61

页码: 2854-2858

3 . 1 0 0

JCR@2022

ESI学科: ENGINEERING;

ESI高被引阀值:176

JCR分区:1

中科院分区:2

被引次数:

WoS核心集被引频次: 3

SCOPUS被引频次: 6

ESI高被引论文在榜: 0 展开所有

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