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Author:

Shan Haiquan (Shan Haiquan.) | Zhang Yuefei (Zhang Yuefei.) (Scholars:张跃飞) | Mao Shengcheng (Mao Shengcheng.) (Scholars:毛圣成) | Zhang Ze (Zhang Ze.)

Indexed by:

SCIE PKU CSCD

Abstract:

The nanocrystalline Ni thin films with high density nano-scale growth twins were synthesized by direct electrodeposition technology. The five-fold twinning structure in electrodeposited nano-twin Ni was systematically investigated by TEM. The remarkable diffraction pattern and HRTEM images obtained from the cross-section observation demonstrate directly that the electrodeposited nano-twin Ni has five-fold twinning structure with five {111} twinned subcrystals and systematically analyzed the 7.35 degrees intrinsic structural gap. In this work, the 7.35 degrees gap was at least inset in two twin boundaries of the five-fold twin, the twin boundaries which share the 7.35 degrees gap always broaden and was decomposed into other twins, so that, the grain present a irregular shape. cross-sectional TEM micrograph revealed that the electrodeposited nano-twin Ni had columnar grain structure with a strong {110} texture. By means of comprehensive structure characterization, a new space structural model of the five-fold twin was proposed.

Keyword:

nanao- twin Ni transmission electron microscopy (TEM) electrodeposition microstructure five-fold twin

Author Community:

  • [ 1 ] [Shan Haiquan]Beijing Univ Technol, Inst Microstruct & Properties Adv Mat, Beijing 100124, Peoples R China
  • [ 2 ] [Zhang Yuefei]Beijing Univ Technol, Inst Microstruct & Properties Adv Mat, Beijing 100124, Peoples R China
  • [ 3 ] [Mao Shengcheng]Beijing Univ Technol, Inst Microstruct & Properties Adv Mat, Beijing 100124, Peoples R China
  • [ 4 ] [Zhang Ze]Zhejiang Univ, Dept Mat Sci & Engn, Hangzhou 310058, Zhejiang, Peoples R China

Reprint Author's Address:

  • 张跃飞

    [Zhang Yuefei]Beijing Univ Technol, Inst Microstruct & Properties Adv Mat, Beijing 100124, Peoples R China

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Source :

ACTA METALLURGICA SINICA

ISSN: 0412-1961

Year: 2014

Issue: 3

Volume: 50

Page: 305-312

2 . 3 0 0

JCR@2022

ESI HC Threshold:341

JCR Journal Grade:3

CAS Journal Grade:4

Cited Count:

WoS CC Cited Count: 4

SCOPUS Cited Count: 5

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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