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作者:

Shan Haiquan (Shan Haiquan.) | Zhang Yuefei (Zhang Yuefei.) (学者:张跃飞) | Mao Shengcheng (Mao Shengcheng.) (学者:毛圣成) | Zhang Ze (Zhang Ze.)

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EI Scopus SCIE PKU CSCD

摘要:

The nanocrystalline Ni thin films with high density nano-scale growth twins were synthesized by direct electrodeposition technology. The five-fold twinning structure in electrodeposited nano-twin Ni was systematically investigated by TEM. The remarkable diffraction pattern and HRTEM images obtained from the cross-section observation demonstrate directly that the electrodeposited nano-twin Ni has five-fold twinning structure with five {111} twinned subcrystals and systematically analyzed the 7.35 degrees intrinsic structural gap. In this work, the 7.35 degrees gap was at least inset in two twin boundaries of the five-fold twin, the twin boundaries which share the 7.35 degrees gap always broaden and was decomposed into other twins, so that, the grain present a irregular shape. cross-sectional TEM micrograph revealed that the electrodeposited nano-twin Ni had columnar grain structure with a strong {110} texture. By means of comprehensive structure characterization, a new space structural model of the five-fold twin was proposed.

关键词:

electrodeposition five-fold twin microstructure nanao- twin Ni transmission electron microscopy (TEM)

作者机构:

  • [ 1 ] [Shan Haiquan]Beijing Univ Technol, Inst Microstruct & Properties Adv Mat, Beijing 100124, Peoples R China
  • [ 2 ] [Zhang Yuefei]Beijing Univ Technol, Inst Microstruct & Properties Adv Mat, Beijing 100124, Peoples R China
  • [ 3 ] [Mao Shengcheng]Beijing Univ Technol, Inst Microstruct & Properties Adv Mat, Beijing 100124, Peoples R China
  • [ 4 ] [Zhang Ze]Zhejiang Univ, Dept Mat Sci & Engn, Hangzhou 310058, Zhejiang, Peoples R China

通讯作者信息:

  • 张跃飞

    [Zhang Yuefei]Beijing Univ Technol, Inst Microstruct & Properties Adv Mat, Beijing 100124, Peoples R China

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来源 :

ACTA METALLURGICA SINICA

ISSN: 0412-1961

年份: 2014

期: 3

卷: 50

页码: 305-312

2 . 3 0 0

JCR@2022

ESI学科: MATERIALS SCIENCE;

ESI高被引阀值:256

JCR分区:3

中科院分区:4

被引次数:

WoS核心集被引频次: 4

SCOPUS被引频次: 5

ESI高被引论文在榜: 0 展开所有

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