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作者:

Zheng, Kun (Zheng, Kun.) (学者:郑坤) | Shao, Ruiwen (Shao, Ruiwen.) | Deng, Qingsong (Deng, Qingsong.) | Zhang, Yuefei (Zhang, Yuefei.) (学者:张跃飞) | Li, Yujie (Li, Yujie.) | Han, Xiaodong (Han, Xiaodong.) (学者:韩晓东) | Zhang, Ze (Zhang, Ze.) | Zou, Jin (Zou, Jin.)

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EI Scopus SCIE

摘要:

In this study, enhancements of the carrier transport properties of p-type < 100 >-oriented Si whiskers are observed under uniaxial tensile and compressive strains. It has been found that over 400% enhancement of electrical conductivity is achieved under a 2% tensile strain, while a 2% compressive strain can only cause similar to 80% conductivity enhancement. The enhancements are mainly attributed to the breaking of the degeneracy of the v2 and v1 valence bands induced a reduction of the hole effective mass. This study provides an important insight of how the carrier mobility variation caused by the strain impact on their transport properties. (C) 2014 AIP Publishing LLC.

关键词:

作者机构:

  • [ 1 ] [Zheng, Kun]Beijing Univ Technol, Inst Microstruct & Properties Adv Mat, Beijing 100124, Peoples R China
  • [ 2 ] [Shao, Ruiwen]Beijing Univ Technol, Inst Microstruct & Properties Adv Mat, Beijing 100124, Peoples R China
  • [ 3 ] [Deng, Qingsong]Beijing Univ Technol, Inst Microstruct & Properties Adv Mat, Beijing 100124, Peoples R China
  • [ 4 ] [Zhang, Yuefei]Beijing Univ Technol, Inst Microstruct & Properties Adv Mat, Beijing 100124, Peoples R China
  • [ 5 ] [Li, Yujie]Beijing Univ Technol, Inst Microstruct & Properties Adv Mat, Beijing 100124, Peoples R China
  • [ 6 ] [Han, Xiaodong]Beijing Univ Technol, Inst Microstruct & Properties Adv Mat, Beijing 100124, Peoples R China
  • [ 7 ] [Zhang, Ze]Zhejiang Univ, Dept Mat Sci, Hangzhou 310058, Zhejiang, Peoples R China
  • [ 8 ] [Zou, Jin]Univ Queensland, Brisbane, Qld 4072, Australia
  • [ 9 ] [Zou, Jin]Univ Queensland, Ctr Microscopy & Microanal, Brisbane, Qld 4072, Australia

通讯作者信息:

  • 郑坤

    [Zheng, Kun]Beijing Univ Technol, Inst Microstruct & Properties Adv Mat, Beijing 100124, Peoples R China

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来源 :

APPLIED PHYSICS LETTERS

ISSN: 0003-6951

年份: 2014

期: 1

卷: 104

4 . 0 0 0

JCR@2022

ESI学科: PHYSICS;

ESI高被引阀值:202

JCR分区:1

中科院分区:2

被引次数:

WoS核心集被引频次: 16

SCOPUS被引频次: 17

ESI高被引论文在榜: 0 展开所有

万方被引频次:

中文被引频次:

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