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作者:

Wang, Xue-Peng (Wang, Xue-Peng.) | Chen, Nian-Ke (Chen, Nian-Ke.) | Li, Xian-Bin (Li, Xian-Bin.) | Cheng, Yan (Cheng, Yan.) | Liu, X. Q. (Liu, X. Q..) | Xia, Meng-Jiao (Xia, Meng-Jiao.) | Song, Z. T. (Song, Z. T..) | Han, X. D. (Han, X. D..) (学者:韩晓东) | Zhang, S. B. (Zhang, S. B..) | Sun, Hong-Bo (Sun, Hong-Bo.)

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Scopus SCIE

摘要:

The nano amorphous interface is important as it controls the phase transition for data storage. Yet, atomic scale insights into such kinds of systems are still rare. By first-principles calculations, we obtain the atomic interface between amorphous Si and amorphous Sb2Te3, which prevails in the series of Si-Sb-Te phase change materials. This interface model reproduces the experiment-consistent phenomena, i.e. the amorphous stability of Sb2Te3, which defines the data retention in phase change memory, and is greatly enhanced by the nano interface. More importantly, this method offers a direct platform to explore the intrinsic mechanism to understand the material function: (1) by steric effects through the atomic "channel'' of the amorphous interface, the arrangement of the Te network is significantly distorted and is separated from the p-orbital bond angle in the conventional phase-change material; and (2) through the electronic "channel'' of the amorphous interface, high localized electrons in the form of a lone pair are "projected'' to Sb2Te3 from amorphous Si by a proximity effect. These factors set an effective barrier for crystallization and improve the amorphous stability, and thus data retention. The present research and scheme sheds new light on the engineering and manipulation of other key amorphous interfaces, such as Si3N4/Ge2Sb2Te5 and C/Sb2Te3, through first-principles calculations towards non-volatile phase change memory.

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作者机构:

  • [ 1 ] [Wang, Xue-Peng]Jilin Univ, Coll Elect Sci & Engn, State Key Lab Integrated Optoelect, Changchun 130023, Peoples R China
  • [ 2 ] [Chen, Nian-Ke]Jilin Univ, Coll Elect Sci & Engn, State Key Lab Integrated Optoelect, Changchun 130023, Peoples R China
  • [ 3 ] [Li, Xian-Bin]Jilin Univ, Coll Elect Sci & Engn, State Key Lab Integrated Optoelect, Changchun 130023, Peoples R China
  • [ 4 ] [Zhang, S. B.]Jilin Univ, Coll Elect Sci & Engn, State Key Lab Integrated Optoelect, Changchun 130023, Peoples R China
  • [ 5 ] [Sun, Hong-Bo]Jilin Univ, Coll Elect Sci & Engn, State Key Lab Integrated Optoelect, Changchun 130023, Peoples R China
  • [ 6 ] [Cheng, Yan]Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai, Peoples R China
  • [ 7 ] [Xia, Meng-Jiao]Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai, Peoples R China
  • [ 8 ] [Song, Z. T.]Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai, Peoples R China
  • [ 9 ] [Cheng, Yan]Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Nanotechnol Lab, Shanghai, Peoples R China
  • [ 10 ] [Xia, Meng-Jiao]Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Nanotechnol Lab, Shanghai, Peoples R China
  • [ 11 ] [Song, Z. T.]Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Nanotechnol Lab, Shanghai, Peoples R China
  • [ 12 ] [Liu, X. Q.]Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Beijing, Peoples R China
  • [ 13 ] [Han, X. D.]Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Beijing, Peoples R China
  • [ 14 ] [Zhang, S. B.]Rensselaer Polytech Inst, Dept Phys Appl Phys & Astron, Troy, NY USA

通讯作者信息:

  • [Li, Xian-Bin]Jilin Univ, Coll Elect Sci & Engn, State Key Lab Integrated Optoelect, Changchun 130023, Peoples R China

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来源 :

PHYSICAL CHEMISTRY CHEMICAL PHYSICS

ISSN: 1463-9076

年份: 2014

期: 22

卷: 16

页码: 10810-10815

3 . 3 0 0

JCR@2022

ESI学科: CHEMISTRY;

ESI高被引阀值:195

JCR分区:1

中科院分区:2

被引次数:

WoS核心集被引频次: 22

SCOPUS被引频次: 24

ESI高被引论文在榜: 0 展开所有

万方被引频次:

中文被引频次:

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