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作者:

Wang, Min (Wang, Min.) (学者:王民) | Zan, Tao (Zan, Tao.) | Gao, Xiangsheng (Gao, Xiangsheng.)

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Scopus SCIE

摘要:

Machining performance of boring processes is often limited by chatter vibration when the boring bar is with a large slenderness ratio. The dynamic vibration absorber (DVA) is the most widely used damper in practical chatter control of boring bars. The DVA consists of an additional mass-spring-damper subsystem and needs accurate tuning of its natural frequency and damping ratio to match the main structure. Compared with the DVA, the friction damper consisting of a mass attached to the boring bar through a sliding interface near the tool insert is more simple and easy for design and implementation. The main purpose of this paper is to model the friction damper and investigate its chatter suppression effect. A mathematical model is established to depict the friction force at the friction interface between the damper body and the main structure. Based on the modeling of the fundamental principle of the friction, the dynamic behavior and machining stability of the friction damper damped boring system can be predicted and analyzed. Parameter studies are also carried out using the numerical model to evaluate the machining stability improvement by using the friction damper and identify the best configuration to maximize the boring stability.

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作者机构:

  • [ 1 ] [Wang, Min]Beijing Univ Technol, Sch Mech & Appl Elect Engn, Beijing Key Lab Adv Mfg Technol, Beijing 100124, Peoples R China
  • [ 2 ] [Zan, Tao]Beijing Univ Technol, Sch Mech & Appl Elect Engn, Beijing Key Lab Adv Mfg Technol, Beijing 100124, Peoples R China
  • [ 3 ] [Gao, Xiangsheng]Beijing Univ Technol, Sch Mech & Appl Elect Engn, Beijing Key Lab Adv Mfg Technol, Beijing 100124, Peoples R China

通讯作者信息:

  • 王民

    [Wang, Min]Beijing Univ Technol, Sch Mech & Appl Elect Engn, Beijing Key Lab Adv Mfg Technol, Beijing 100124, Peoples R China

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来源 :

ADVANCES IN MECHANICAL ENGINEERING

ISSN: 1687-8132

年份: 2014

2 . 1 0 0

JCR@2022

ESI学科: ENGINEERING;

ESI高被引阀值:176

JCR分区:3

中科院分区:4

被引次数:

WoS核心集被引频次: 2

SCOPUS被引频次: 7

ESI高被引论文在榜: 0 展开所有

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