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作者:

Pei, Mingde (Pei, Mingde.) | Wang, Bo (Wang, Bo.) (学者:王波) | Tang, Yunhui (Tang, Yunhui.) | Song, Xuemei (Song, Xuemei.) | Yan, Hui (Yan, Hui.) | Zhang, Xiaoxue (Zhang, Xiaoxue.)

收录:

EI Scopus SCIE

摘要:

Superhydrophobic copper films with hierarchically sandbeach-like morphologies were grown on Si substrates using direct current (DC) sputtering. After the surfaces were hydrophobized with 1-Octadecanethiol (ODT), the surfaces became superhydrophobic. The substrate temperature during sputtering played a key role in the formation of the surface morphology. The films exhibited long-term stability in the temperature range of 25 to 100 degrees C. The underwater stability of the surfaces was also characterized by studying the water contact behavior on the immersed surfaces under different static pressures. After immersion in different depth in water, the film surfaces changed from superhydrophobic even to superhydrophilic, due to the water trapped in the surface structures. A model was proposed to explain such change in the surface wettability. (C) 2013 Elsevier B. V. All rights reserved.

关键词:

Contact angle Copper Sputtering Superhydrophobicity

作者机构:

  • [ 1 ] [Pei, Mingde]Beijing Univ Technol, Dept Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 2 ] [Wang, Bo]Beijing Univ Technol, Dept Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 3 ] [Tang, Yunhui]Beijing Univ Technol, Dept Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 4 ] [Song, Xuemei]Beijing Univ Technol, Dept Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 5 ] [Yan, Hui]Beijing Univ Technol, Dept Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 6 ] [Zhang, Xiaoxue]Tampere Univ Technol, Dept Mat Sci, Lab Ceram Mat, FI-33101 Tampere, Finland
  • [ 7 ] [Zhang, Xiaoxue]UCL, Dept Chem, London WC14 0AJ, England

通讯作者信息:

  • 王波

    [Wang, Bo]Beijing Univ Technol, Dept Mat Sci & Engn, Beijing 100124, Peoples R China

电子邮件地址:

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来源 :

THIN SOLID FILMS

ISSN: 0040-6090

年份: 2013

卷: 548

页码: 313-316

2 . 1 0 0

JCR@2022

ESI学科: MATERIALS SCIENCE;

ESI高被引阀值:263

JCR分区:2

中科院分区:3

被引次数:

WoS核心集被引频次: 8

SCOPUS被引频次: 9

ESI高被引论文在榜: 0 展开所有

万方被引频次:

中文被引频次:

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