One-　and　two-dimensional　plasmonic　nanostructures　can　be　fabricated　using　nanoscale　tensile　stress.　A　polymer　layer,　coated　with　a　thin　metal　film,　is　exposed　to　an　interference　pattern　produced　by　ultraviolet　laser　beams.　Crosslinking　is　induced　between　the　polymeric　molecules　located　within　the　bright　fringes.　This　process　not　only　increases　the　refractive　index　but　also　reduces　the　polymer　layer　thickness.　Corrugations　occur　on　the　continuous　thin　metal　film　due　to　the　nanoscale　stress　in　the　polymer　layer.　Thus,　a　periodic　nanostructure　of　area　3　x　3　mm　and　depth　50　nm　is　created　both　in　the　polymer　and　metal　films　with　excellent　homogeneity　and　reproducibility.　This　method　enables　direct　writing　of　a　large-area　plasmonic　nanostructure　at　low　cost　which　can　be　used　in　the　design　of　optoelectronic　devices　and　sensors.　(C)2013　Optical　Society　of　America