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作者:

Zhang, Yamin (Zhang, Yamin.) | Feng, Shiwei (Feng, Shiwei.) (学者:冯士维) | Zhu, Hui (Zhu, Hui.) | Zhang, Guangchen (Zhang, Guangchen.) | Deng, Bing (Deng, Bing.) | Ma, Lin (Ma, Lin.)

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摘要:

The forward Schottky characteristic method, utilizing the temperature dependence of forward gate-source Schottky junction voltage, has been used to measure the transient temperature rise under DC and cycle pulse for multi-finger AlGaN/GaN high electron mobility transistor. The effect of electrical pulse on channel temperature has been studied. The transient temperature rise of channel under pulses with different duty cycles and frequencies are determined, respectively. The measurement results show that operation under high frequency and/or low duty cycle can improve the lifetime and performance reliability of AlGaN/GaN HEMT devices effectively. Furthermore, the measurement results are found to be consistent with the electro-thermal simulation results performed for the device. (C) 2013 AIP Publishing LLC.

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作者机构:

  • [ 1 ] [Zhang, Yamin]Beijing Univ Technol, Coll Elect Informat & Control Engn, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 2 ] [Feng, Shiwei]Beijing Univ Technol, Coll Elect Informat & Control Engn, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 3 ] [Zhu, Hui]Beijing Univ Technol, Coll Elect Informat & Control Engn, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 4 ] [Zhang, Guangchen]Beijing Univ Technol, Coll Elect Informat & Control Engn, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 5 ] [Deng, Bing]Beijing Univ Technol, Coll Elect Informat & Control Engn, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 6 ] [Ma, Lin]Beijing Univ Technol, Coll Elect Informat & Control Engn, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China

通讯作者信息:

  • [Zhang, Yamin]Beijing Univ Technol, Coll Elect Informat & Control Engn, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China

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来源 :

JOURNAL OF APPLIED PHYSICS

ISSN: 0021-8979

年份: 2013

期: 9

卷: 114

3 . 2 0 0

JCR@2022

ESI学科: PHYSICS;

ESI高被引阀值:162

JCR分区:2

中科院分区:3

被引次数:

WoS核心集被引频次: 8

SCOPUS被引频次:

ESI高被引论文在榜: 0 展开所有

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中文被引频次:

近30日浏览量: 2

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