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作者:

Feng, Chao (Feng, Chao.) | Wang, Yonggang (Wang, Yonggang.) | Liu, Jie (Liu, Jie.) | Tsang, Yuen H. (Tsang, Yuen H..) | Song, Yanrong (Song, Yanrong.) (学者:宋晏蓉) | Yu, Zhenhua (Yu, Zhenhua.)

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EI Scopus SCIE

摘要:

A novel reflective graphene oxide based saturable absorber is fabricated and used to passively mode locked the Nd:YVO4 ultrafast laser system. The maximum average output power measured is 3.06W and the optical to optical conversion efficiency is about 25%. The measured pulse duration and repetition rate are 8.8 ps and 84 MHz. The maximum peak power and the single pulse energy of the mode-locking laser are up to 4.1 kW and 36 nJ, respectively. To the best of our knowledge, it is the highest average output power for the lasers mode locked with graphene based absorbers. (C) 2013 Elsevier B.V. All rights reserved.

关键词:

Absorber Average output power Graphene oxide Mode locking Ultrafast laser

作者机构:

  • [ 1 ] [Feng, Chao]Shandong Normal Univ, Coll Phys & Elect, Jinan 250014, Shandong, Peoples R China
  • [ 2 ] [Liu, Jie]Shandong Normal Univ, Coll Phys & Elect, Jinan 250014, Shandong, Peoples R China
  • [ 3 ] [Wang, Yonggang]Hong Kong Polytech Univ, Dept Appl Phys, Hong Kong, Hong Kong, Peoples R China
  • [ 4 ] [Tsang, Yuen H.]Hong Kong Polytech Univ, Dept Appl Phys, Hong Kong, Hong Kong, Peoples R China
  • [ 5 ] [Wang, Yonggang]Chinese Acad Sci, State Key Lab Transient Opt & Photon, Xian Inst Opt & Precis Mech, Xian, Peoples R China
  • [ 6 ] [Song, Yanrong]Beijing Univ Technol, Inst Informat Photon Technol, Beijing, Peoples R China
  • [ 7 ] [Yu, Zhenhua]Beijing Univ Technol, Inst Informat Photon Technol, Beijing, Peoples R China
  • [ 8 ] [Song, Yanrong]Beijing Univ Technol, Coll Appl Sci, Beijing, Peoples R China
  • [ 9 ] [Yu, Zhenhua]Beijing Univ Technol, Coll Appl Sci, Beijing, Peoples R China

通讯作者信息:

  • [Liu, Jie]Shandong Normal Univ, Coll Phys & Elect, Jinan 250014, Shandong, Peoples R China

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来源 :

OPTICS COMMUNICATIONS

ISSN: 0030-4018

年份: 2013

卷: 298

页码: 168-170

2 . 4 0 0

JCR@2022

ESI学科: PHYSICS;

ESI高被引阀值:162

JCR分区:2

中科院分区:3

被引次数:

WoS核心集被引频次: 24

SCOPUS被引频次: 28

ESI高被引论文在榜: 0 展开所有

万方被引频次:

中文被引频次:

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