The　exposure　schedule　model　for　uniform　diffraction　efficiency　is　extended　to　be　suitable　for　the　partially　overlapping　multiplexing　method.　The　proposed　model　is　based　on　solving　an　optimization　problem.　Fifty　holograms　were　multiplexed　using　the　exposure　schedule　calculated　with　the　extended　model.　The　material　used　in　the　experiment　is　based　on　the　photopolymerization　of　a　free　radical.　By　comparing　the　intensity　of　the　reconstructed　images　during　recording　with　that　readout　after　recording,　the　calculated　exposure　schedule　is　verified　to　be　effective　to　realize　the　uniform　diffraction　efficiency　for　the　multiplexing　holographic　storage.　(C)　The　Authors.　Published　by　SPIE　under　a　Creative　Commons　Attribution　3.0　Unported　License.　Distribution　or　reproduction　of　this　work　in　whole　or　in　part　requires　full　attribution　of　the　original　publication,　including　its　DOI.