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作者:

Guo Zhichao (Guo Zhichao.) | Suo Hongli (Suo Hongli.) (学者:索红莉) | Liu Zhiyong (Liu Zhiyong.) | Sandu, V. (Sandu, V..) | Aldica, G. (Aldica, G..) | Badica, P. (Badica, P..)

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摘要:

The tunnel-diode resonator (TDR) technique for accurate measurements of the magnetic penetration depth is used to measure the London and Campbell penetration depths of polycrystalline SiC doped (10wt.%) MgB2. The Campbell length was used to investigate the field and temperature dependence of the critical current density. The as determined critical current density provides values as high as 6x10(6) A/cm(2) at 4.2K, 1T, which is higher than values estimated by Bean method.

关键词:

Campbell length Critical current density Magnetic penetration depths Tunnel-diode resonator technique

作者机构:

  • [ 1 ] [Guo Zhichao]Beijing Univ Technol, Coll Mat Sci & Engn, Key Lab Adv Funct Mat, Minist Educ, Beijing 100124, Peoples R China
  • [ 2 ] [Suo Hongli]Beijing Univ Technol, Coll Mat Sci & Engn, Key Lab Adv Funct Mat, Minist Educ, Beijing 100124, Peoples R China
  • [ 3 ] [Liu Zhiyong]Beijing Univ Technol, Coll Mat Sci & Engn, Key Lab Adv Funct Mat, Minist Educ, Beijing 100124, Peoples R China
  • [ 4 ] [Sandu, V.]Natl Inst Mat Phys Bucharest, Dept Magnetism & Superconduct, Magurele 077125, Romania
  • [ 5 ] [Aldica, G.]Natl Inst Mat Phys Bucharest, Dept Magnetism & Superconduct, Magurele 077125, Romania
  • [ 6 ] [Badica, P.]Natl Inst Mat Phys Bucharest, Dept Magnetism & Superconduct, Magurele 077125, Romania

通讯作者信息:

  • 索红莉

    [Suo Hongli]Beijing Univ Technol, Coll Mat Sci & Engn, Key Lab Adv Funct Mat, Minist Educ, Beijing 100124, Peoples R China

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来源 :

OPTOELECTRONICS AND ADVANCED MATERIALS-RAPID COMMUNICATIONS

ISSN: 1842-6573

年份: 2012

期: 11-12

卷: 6

页码: 976-979

0 . 5 0 0

JCR@2022

ESI学科: MATERIALS SCIENCE;

ESI高被引阀值:294

JCR分区:4

中科院分区:4

被引次数:

WoS核心集被引频次: 0

SCOPUS被引频次:

ESI高被引论文在榜: 0 展开所有

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