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作者:

Wang, B. B. (Wang, B. B..) | Ostrikov, K. (Ostrikov, K..) | Gong, C. S. (Gong, C. S..) | Xie, E. Q. (Xie, E. Q..) | Wang, R. Z. (Wang, R. Z..) (学者:王如志)

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摘要:

The electron field emission (EFE) properties of nitrogenated carbon nanotips (NCNTPs) were studied under high-vacuum conditions. The NCNTPs were prepared in a plasma-assisted hot filament chemical vapor deposition system using CH4 and N-2 as the carbon and nitrogen sources, respectively. The work functions of NCNTPs were measured using x-ray photoelectron spectroscopy. The morphological and structural properties of NCNTPs were studied by field emission scanning electron microscopy, micro-Raman spectroscopy, and x-ray photoelectron spectroscopy. The field enhancement factors of NCNTPs were calculated using relevant EFE models based on the Fowler-Nordheim approximation. Analytical characterization and modeling results were used to establish the relations between the EFE properties of NCNTPs and their morphology, structure, and composition. It is shown that the EFE properties of NCNTPs can be enhanced by the reduction of oxygen termination on the surface as well as by increasing the ratio of the NCNTP height to the radius of curvature at its top. These results also suggest that a significant amount of electrons is emitted from other surface areas besides the NCNTP tops, contrary to the common belief. The outcomes of this study advance our knowledge on the electron emission properties of carbon nanomaterials and contribute to the development of the next-generation of advanced applications in the fields of micro- and opto-electronics. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4759047]

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作者机构:

  • [ 1 ] [Wang, B. B.]Chongqing Univ Technol, Coll Chem & Chem Engn, Chongqing 400054, Peoples R China
  • [ 2 ] [Wang, B. B.]CSIRO Mat Sci & Engn, PNCA, Lindfield, NSW 2070, Australia
  • [ 3 ] [Ostrikov, K.]CSIRO Mat Sci & Engn, PNCA, Lindfield, NSW 2070, Australia
  • [ 4 ] [Ostrikov, K.]Univ Sydney, Sch Phys, Sydney, NSW 2006, Australia
  • [ 5 ] [Gong, C. S.]Lanzhou Univ, Sch Phys Sci & Technol, Lanzhou 73000, Peoples R China
  • [ 6 ] [Xie, E. Q.]Lanzhou Univ, Sch Phys Sci & Technol, Lanzhou 73000, Peoples R China
  • [ 7 ] [Wang, R. Z.]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China

通讯作者信息:

  • [Wang, B. B.]Chongqing Univ Technol, Coll Chem & Chem Engn, 69 Hongguang Rd, Chongqing 400054, Peoples R China

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来源 :

JOURNAL OF APPLIED PHYSICS

ISSN: 0021-8979

年份: 2012

期: 8

卷: 112

3 . 2 0 0

JCR@2022

ESI学科: PHYSICS;

ESI高被引阀值:178

JCR分区:1

中科院分区:3

被引次数:

WoS核心集被引频次: 8

SCOPUS被引频次: 8

ESI高被引论文在榜: 0 展开所有

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