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作者:

Liu Jian-Peng (Liu Jian-Peng.) | Zhu Yan-Xu (Zhu Yan-Xu.) | Guo Wei-Ling (Guo Wei-Ling.) | Yan Wei-Wei (Yan Wei-Wei.) | Wu Guo-Qing (Wu Guo-Qing.)

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Scopus SCIE PKU CSCD

摘要:

In the recent years, more and more light-emitting diodes use indium tin oxide (ITO) as the current spreading layer. But if there is not any treatment, the electrical properties of light emitting diode are very poor. So to get excellent electrical properties of light emitting diode, annealing is an effective Method to improve the electrical properties of light emitting diode using indium tin oxide as the current spreading layer. However, the annealing time and temperature can affect the electrical property of light emitting diode individually. In order to investigate this problem, we measured the series resistance and ideality factor of the light emitting diode got under different annealing time and annealing temperature. According to the model proposed by Jay M. Shah, we can inferred the characteristics of indium tin oxide and P-type GaN contact. The results showed that: the electrical properties of the light-emitting diode can reach an excellent value with increasing annealing temperature and time, and if continuing to increase in temperature or time, it can lead to a decline in light-emitting diode electrical properties. It is very helpful to optimize the annealing temperature and time and manufacture excellent electrical properties of devices.

关键词:

annealed ideality factors ITO series resistance

作者机构:

  • [ 1 ] [Liu Jian-Peng]Beijing Univ Technol, Beijing Oproelect Technol Lab, Beijing 100124, Peoples R China
  • [ 2 ] [Zhu Yan-Xu]Beijing Univ Technol, Beijing Oproelect Technol Lab, Beijing 100124, Peoples R China
  • [ 3 ] [Guo Wei-Ling]Beijing Univ Technol, Beijing Oproelect Technol Lab, Beijing 100124, Peoples R China
  • [ 4 ] [Yan Wei-Wei]Beijing Univ Technol, Beijing Oproelect Technol Lab, Beijing 100124, Peoples R China
  • [ 5 ] [Wu Guo-Qing]Beijing Univ Technol, Beijing Oproelect Technol Lab, Beijing 100124, Peoples R China

通讯作者信息:

  • [Liu Jian-Peng]Beijing Univ Technol, Beijing Oproelect Technol Lab, Beijing 100124, Peoples R China

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来源 :

ACTA PHYSICA SINICA

ISSN: 1000-3290

年份: 2012

期: 13

卷: 61

1 . 0 0 0

JCR@2022

ESI学科: PHYSICS;

ESI高被引阀值:178

JCR分区:3

中科院分区:4

被引次数:

WoS核心集被引频次: 2

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