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作者:

Wang, B. B. (Wang, B. B..) | Cheng, Q. J. (Cheng, Q. J..) | Zhong, X. X. (Zhong, X. X..) | Wang, Y. Q. (Wang, Y. Q..) | Chen, Y. A. (Chen, Y. A..) | Ostrikov, K. (Ostrikov, K..)

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EI Scopus SCIE

摘要:

Nitrogenated carbon nanotips (NCNTPs) are synthesized by plasma-enhanced hot filament chemical vapor deposition from the hydrogen, methane, and nitrogen gas mixtures with different flow rate ratios of hydrogen to nitrogen. The morphological, structural, compositional, and electron field emission (EFE) properties of the NCNTPs were investigated by field emission scanning electron microscopy, Raman spectroscopy, x ray photoelectron spectroscopy, and EFE high-vacuum system. It is shown that the NCNTPs deposited at an intermediate flow rate ratio of hydrogen to nitrogen feature the best size/shape and pattern uniformity, the highest nanotip density, the highest nitrogen concentration, as well as the best electron field emission performance. Several factors that come into play along with the nitrogen incorporation, such as the combined effect of the plasma sputtering and etching, the transition of sp(3) carbon clusters to sp(2) carbon clusters, the increase of the size of the sp(2) clusters, as well as the reduction of the work function, have been examined to interpret these experimental findings. Our results are highly relevant to the development of the next generation electron field emitters, flat panel displays, atomic force microscope probes, and several other advanced applications. (C) 2012 American Institute of Physics. [http:/dx.doi.org/10.1063/1.3688252]

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作者机构:

  • [ 1 ] [Wang, B. B.]CSIRO Mat Sci & Engn, PNCA, Lindfield, NSW 2070, Australia
  • [ 2 ] [Cheng, Q. J.]CSIRO Mat Sci & Engn, PNCA, Lindfield, NSW 2070, Australia
  • [ 3 ] [Ostrikov, K.]CSIRO Mat Sci & Engn, PNCA, Lindfield, NSW 2070, Australia
  • [ 4 ] [Wang, B. B.]Chongqing Univ Technol, Coll Chem & Chem Engn, Chongqing 400054, Peoples R China
  • [ 5 ] [Cheng, Q. J.]Univ Sydney, Sch Phys, Sydney, NSW 2006, Australia
  • [ 6 ] [Ostrikov, K.]Univ Sydney, Sch Phys, Sydney, NSW 2006, Australia
  • [ 7 ] [Zhong, X. X.]Shanghai Jiao Tong Univ, Minist Educ, Key Lab Laser Plasmas, Shanghai 200240, Peoples R China
  • [ 8 ] [Zhong, X. X.]Shanghai Jiao Tong Univ, Dept Phys, Shanghai 200240, Peoples R China
  • [ 9 ] [Wang, Y. Q.]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 10 ] [Chen, Y. A.]Chongqing Univ, Coll Mat Sci & Engn, Chongqing 400044, Peoples R China

通讯作者信息:

  • [Ostrikov, K.]CSIRO Mat Sci & Engn, PNCA, POB 218, Lindfield, NSW 2070, Australia

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来源 :

JOURNAL OF APPLIED PHYSICS

ISSN: 0021-8979

年份: 2012

期: 4

卷: 111

3 . 2 0 0

JCR@2022

ESI学科: PHYSICS;

ESI高被引阀值:178

JCR分区:1

中科院分区:3

被引次数:

WoS核心集被引频次: 28

SCOPUS被引频次: 25

ESI高被引论文在榜: 0 展开所有

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中文被引频次:

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