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作者:

Chen Fei (Chen Fei.) | Zhou Hai (Zhou Hai.) | Zhang Yuefei (Zhang Yuefei.) (学者:张跃飞) | Lu Fanxiu (Lu Fanxiu.)

收录:

EI Scopus SCIE PKU CSCD

摘要:

At atmospheric pressure, diamond-like carbon (DLC) thin films were deposited on the Ti6Al4V alloy surface by a DBD plasma gun at low temperature (<350 degrees C), with CH4 as a precursor and Ar as dilution gas. The structure of the DLC thin film was analyzed by Laser Raman spectroscope and X-ray photoelectron spectroscopy. The surface morphology was observed through scanning electron microscopy. The adhesion between the DLC thin film and the substrate was investigated with the scribe testing. The friction and wear behavior of the DLC thin films under dry sliding against GCr15 steel was evaluated on a ball-on-disc test rig. The results show that it is feasible to prepare a DLC thin film of 1.0 mu m thickness by a plasma gun. The film is uniform and dense and the surface roughness R-a is about 13.23 nm. The critical load of adhesion force between the DLC thin film and the substrate is 31.0 N. It has been found that the DLC thin film has excellent friction- and wear-resistant behavior. The friction coefficient of the Ti6Al4V substrate is about 0.50 under dry sliding against steel, while the DLC thin film experiences much abated friction coefficient to 0.15 under the same testing condition.

关键词:

atmospheric pressure plasma gun DLC film Ti6Al4V wear resistance

作者机构:

  • [ 1 ] [Chen Fei]Beijing Inst Petrochem Technol, Dept Mat Sci & Engn, Beijing 102617, Peoples R China
  • [ 2 ] [Zhang Yuefei]Beijing Univ Technol, Beijing 100124, Peoples R China
  • [ 3 ] [Chen Fei]Univ Sci & Technol Beijing, Beijing 100083, Peoples R China
  • [ 4 ] [Lu Fanxiu]Univ Sci & Technol Beijing, Beijing 100083, Peoples R China

通讯作者信息:

  • [Chen Fei]Beijing Inst Petrochem Technol, Dept Mat Sci & Engn, Beijing 102617, Peoples R China

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来源 :

RARE METAL MATERIALS AND ENGINEERING

ISSN: 1002-185X

年份: 2012

期: 1

卷: 41

页码: 124-128

0 . 7 0 0

JCR@2022

ESI学科: MATERIALS SCIENCE;

ESI高被引阀值:294

JCR分区:4

中科院分区:4

被引次数:

WoS核心集被引频次: 1

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ESI高被引论文在榜: 0 展开所有

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