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作者:

Wang, Jinhui (Wang, Jinhui.) | Gong, Na (Gong, Na.) | Hou, Ligang (Hou, Ligang.) | Peng, Xiaohong (Peng, Xiaohong.) | Sridhar, Ramalingam (Sridhar, Ramalingam.) | Wu, Wuchen (Wu, Wuchen.) (学者:吴武臣)

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EI Scopus SCIE

摘要:

The leakage current, active power and delay characterizations of the dynamic dual V-t CMOS circuits in the presence of process, voltage, and temperature (P-V-T) fluctuations are analyzed based on multiple-parameter Monte Carlo method. It is demonstrated that failing to account for P-V-T fluctuations can result in significant reliability problems and inaccuracy in transistor-level performance estimation. It also indicates that under significant P-V-T fluctuations, dual V-t technique (DVT) is still highly effective to reduce the leakage current and active power for dynamic CMOS circuits, but it induces speed penalty. At last, the robustness of different dynamic CMOS circuits with DVT against the P-V-T fluctuations is discussed in detail. (C) 2011 Elsevier Ltd. All rights reserved.

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作者机构:

  • [ 1 ] [Wang, Jinhui]Beijing Univ Technol, VLSI, Beijing 100124, Peoples R China
  • [ 2 ] [Hou, Ligang]Beijing Univ Technol, VLSI, Beijing 100124, Peoples R China
  • [ 3 ] [Peng, Xiaohong]Beijing Univ Technol, VLSI, Beijing 100124, Peoples R China
  • [ 4 ] [Wu, Wuchen]Beijing Univ Technol, VLSI, Beijing 100124, Peoples R China
  • [ 5 ] [Wang, Jinhui]Beijing Univ Technol, Syst Lab, Beijing 100124, Peoples R China
  • [ 6 ] [Hou, Ligang]Beijing Univ Technol, Syst Lab, Beijing 100124, Peoples R China
  • [ 7 ] [Peng, Xiaohong]Beijing Univ Technol, Syst Lab, Beijing 100124, Peoples R China
  • [ 8 ] [Wu, Wuchen]Beijing Univ Technol, Syst Lab, Beijing 100124, Peoples R China
  • [ 9 ] [Gong, Na]SUNY Buffalo, Dept Comp Sci & Engn, Buffalo, NY 14260 USA
  • [ 10 ] [Sridhar, Ramalingam]SUNY Buffalo, Dept Comp Sci & Engn, Buffalo, NY 14260 USA

通讯作者信息:

  • [Wang, Jinhui]Beijing Univ Technol, VLSI, Beijing 100124, Peoples R China

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来源 :

MICROELECTRONICS RELIABILITY

ISSN: 0026-2714

年份: 2011

期: 9-11

卷: 51

页码: 1498-1502

1 . 6 0 0

JCR@2022

ESI学科: ENGINEERING;

JCR分区:2

中科院分区:3

被引次数:

WoS核心集被引频次: 11

SCOPUS被引频次: 13

ESI高被引论文在榜: 0 展开所有

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