Solution-processible　fabrication　techniques　have　been　demonstrated　with　promising　features　for　realizing　different　types　of　plasmonic　devices,　which　combine　interference　lithography,　spin-coating　of　the　colloidal　gold　nanoparticles,　and　subsequent　annealing　process　at　a　temperature　of　200-300　A　degrees　C.　However,　the　resultant　device　needs　to　be　improved　in　the　following　considerations:　(1)　The　photoresist　master　grating　needs　to　be　removed　for　the　applications　in　optoelectronic　or　sensor　devices　and　(2)　each　lattice　site　of　the　photonic　crystals　is　still　composed　of　closely　contacted　gold　nanoparticles.　Actually,　these　metallic　photonic　structures　can　be　refurbished　through　a　further　annealing　process.　Using　an　annealing　temperature　above　450　A　degrees　C,　we　have　successfully　removed　the　remaining　photoresist　and　make　the　gold　nanoparticles　join　into　a　solid　homogenous　unit　on　each　lattice　site　after　being　fully　molten.　Thus,　high-quality　gold　nanostructures　with　excellent　plasmonic　response　can　be　obtained.　This　accomplished　an　improved　recipe　for　the　solution-processible　fabrication　of　plasmonic　nanostructures.　The　corresponding　devices　with　improved　optical　properties　become　more　suitable　for　biosensors　and　optoelectronic　devices.