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作者:

Zhang Guang-Chen (Zhang Guang-Chen.) | Feng Shi-Wei (Feng Shi-Wei.) (学者:冯士维) | Hu Pei-Feng (Hu Pei-Feng.) | Zhao Yan (Zhao Yan.) (学者:赵艳) | Guo Chun-Sheng (Guo Chun-Sheng.) | Xu Yang (Xu Yang.) | Chen Tang-Sheng (Chen Tang-Sheng.) | Jiang Yi-Jian (Jiang Yi-Jian.) (学者:蒋毅坚)

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Scopus SCIE CSCD

摘要:

Channel temperature measurements of multi-finger AlGaN/GaN HEMTs by forward Schottky characteristics are presented. The temperature dependence of the forward gate-source Schottky junction voltage is investigated and it is used as the temperature sensitive parameter (TSP) by pulsed switching technique. The channel-to-mounting thermal resistance of the tested AlGaN/GaN HEMT sample is 19.6 degrees C/W. Compared with both the measured results by micro-Raman method and simulated results of a three-dimensional heat conduction model, the physical meaning of the channel temperature for AlGaN/GaN HEMT tested by pulsed switching electrical TSP method is investigated quantitatively for the first time.

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作者机构:

  • [ 1 ] [Zhang Guang-Chen]Beijing Univ Technol, Sch Elect Informat & Control Engn, Beijing 100124, Peoples R China
  • [ 2 ] [Feng Shi-Wei]Beijing Univ Technol, Sch Elect Informat & Control Engn, Beijing 100124, Peoples R China
  • [ 3 ] [Hu Pei-Feng]Beijing Univ Technol, Sch Elect Informat & Control Engn, Beijing 100124, Peoples R China
  • [ 4 ] [Guo Chun-Sheng]Beijing Univ Technol, Sch Elect Informat & Control Engn, Beijing 100124, Peoples R China
  • [ 5 ] [Xu Yang]Beijing Univ Technol, Sch Elect Informat & Control Engn, Beijing 100124, Peoples R China
  • [ 6 ] [Zhao Yan]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 7 ] [Jiang Yi-Jian]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 8 ] [Chen Tang-Sheng]Nanjing Elect Devices Inst, Nanjing 210016, Peoples R China

通讯作者信息:

  • [Zhang Guang-Chen]Beijing Univ Technol, Sch Elect Informat & Control Engn, Beijing 100124, Peoples R China

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来源 :

CHINESE PHYSICS LETTERS

ISSN: 0256-307X

年份: 2011

期: 1

卷: 28

3 . 5 0 0

JCR@2022

ESI学科: PHYSICS;

JCR分区:3

中科院分区:4

被引次数:

WoS核心集被引频次: 11

SCOPUS被引频次: 14

ESI高被引论文在榜: 0 展开所有

万方被引频次:

中文被引频次:

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