Solution-processible　fabrication　of　large-area　plasmonic　nanostructures　using　colloidal　gold　nanoparticles　has　proven　its　advantages　not　only　in　its　simplicity,　low　cost,　high　speed,　and　high　flexibility,　but　also　in　the　realization　of　some　nanoscale　optoelectronic　devices　that　cannot　be　achieved　by　conventional　methods.　We　demonstrate　in　this　paper　a　variety　of　techniques　for　fabricating　different　plasmonic　nanostructures　using　solution-processible　gold　nanoparticles　and　differently　designed　annealing　processes.　Using　interference　lithography　and　low-(＜　300　degrees　C)　or　high-temperature　(＞　350　degrees　C)　annealing　processes,　we　succeeded　in　fabricating　high-quality　one-and　two-dimensional　metallic　photonic　crystals　which　exhibit　promising　optical　responses　for　the　exploration　of　new　optoelectronic　devices.　Furthermore,　using　direct　high-temperature　(＞　350　degrees　C)　annealing　of　a　thin　film　of　colloidal　gold　nanoparticles,　we　succeeded　in　fabricating　large-area　unpatterned　isolated　gold　nano-island　structures　with　a　mean　diameter　tunable　from　about　35　to　100　nm　and　a　mean　height　from　20　to　70　nm　by　controlling　the　concentration　of　the　gold　nanoparticle　colloid,　the　annealing　temperature,　and　the　surface　properties　of　the　substrate.　The　corresponding　optical　response　is　thus　tunable　in　the　visible　spectral　range　by　changing　the　fabrication　parameters.　This　introduces　a　new　lithography-free　technique　for　the　preparation　of　gold　nanostructures.　These　flexible　fabrication　techniques　constitute　a　systematic　route　for　the　realization　of　plasmonic　nanodevices.