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作者:

Lu, Changzhi (Lu, Changzhi.) | Zhang, Xiaoling (Zhang, Xiaoling.) | Xie, Xuesong (Xie, Xuesong.) | Feng, Shiwei (Feng, Shiwei.) (学者:冯士维) | Diagne, Ibrahima (Diagne, Ibrahima.) | Khan, Arif (Khan, Arif.) | Mohammad, S. Noor (Mohammad, S. Noor.)

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EI Scopus SCIE

摘要:

Interface states modulated reverse leakage current through metal/AlxGa1-xN/GaN diodes has been studied. Reverse leakage current and breakdown voltage have been measured over wide temperature ranges. The investigation suggests that the piezoelectric polarization and the spontaneous polarization at the AlxGa1-xN/GaN heterostructure create polarization induced charges in AlxGa1-xN, and influence the two-dimensional electron gas at the GaN/AlxGa1-xN interface. Both of them dictate the barrier height of the strained AlxGa1-xN Schottky contact. High density of defect states at the metal/AlxGa1-xN interface leads to high reverse leakage current via Fowler-Nordheim emission and/or Frankel-Poole emission. The most notable finding is the reduction in the leakage current almost to zero at high temperatures due to strain relaxation, reduction in defect states, and barrier height enhancement at the metal/AlxGa1-xN interface. Such finding may have significant impact on the way we design high-power microwave devices.

关键词:

semiconductor heterojunctions III-V semiconductors interface states piezoelectric materials leakage currents aluminium compounds Schottky diodes two-dimensional electron gas dielectric polarisation gallium compounds Schottky barriers

作者机构:

  • [ 1 ] [Mohammad, S. Noor]Univ Maryland, Dept Mat Sci & Engn, College Pk, MD 20742 USA
  • [ 2 ] [Lu, Changzhi]Beijing Univ Technol, Coll Elect Informat & Control Engn, Beijing 100022, Peoples R China
  • [ 3 ] [Zhang, Xiaoling]Beijing Univ Technol, Coll Elect Informat & Control Engn, Beijing 100022, Peoples R China
  • [ 4 ] [Xie, Xuesong]Beijing Univ Technol, Coll Elect Informat & Control Engn, Beijing 100022, Peoples R China
  • [ 5 ] [Feng, Shiwei]Beijing Univ Technol, Coll Elect Informat & Control Engn, Beijing 100022, Peoples R China
  • [ 6 ] [Diagne, Ibrahima]Univ Maryland, Dept Elect & Comp Engn, College Pk, MD 20742 USA
  • [ 7 ] [Khan, Arif]Electrocom Corp, Potomac, MD 20859 USA
  • [ 8 ] [Mohammad, S. Noor]USN, Res Lab, Div Elect Sci & Technol, Washington, DC 20375 USA

通讯作者信息:

  • [Mohammad, S. Noor]Univ Maryland, Dept Mat Sci & Engn, College Pk, MD 20742 USA

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来源 :

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

ISSN: 2166-2746

年份: 2008

期: 6

卷: 26

页码: 1987-1992

1 . 4 0 0

JCR@2022

ESI学科: MATERIALS SCIENCE;

JCR分区:2

被引次数:

WoS核心集被引频次: 7

SCOPUS被引频次: 9

ESI高被引论文在榜: 0 展开所有

万方被引频次:

中文被引频次:

近30日浏览量: 1

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