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作者:

Liu, Y. (Liu, Y..) | Tan, T. (Tan, T..) | Wang, B. (Wang, B..) (学者:王波) | Zhai, R. (Zhai, R..) | Song, X. (Song, X..) | Li, E. (Li, E..) | Wang, H. (Wang, H..) | Yan, H. (Yan, H..)

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摘要:

A simple method of microwave assisted chemical bath deposition (MA-CBD) was adopted to fabricate cadmium sulfide (CdS) thin films. The superhydrophobic surface with a water contact angle (CA) of 151 degrees was obtained. Via a scanning electron microscopy (SEM) observation, the film was proved having a porous micro/nano-binary structure which can change the property of the surface and highly enhance the hydrophobicity of the film. A possible mechanism was suggested to describe the growth of the porous structure, in which the microwave heating takes an important role in the formation of two distinct characteristic dimensions of CdS precipitates, the growth of CdS sheets in micro-scale and sphere particles in nano-scale. The superhydrophobic films may provide novel platforms for photovoltaic, sensor, microfluidic and other device applications. (C) 2007 Published by Elsevier Inc.

关键词:

cadmium sulfide films micro-nano-binary structures microwave irradiation superhydrophobic wertability

作者机构:

  • [ 1 ] [Liu, Y.]Beijing Univ Technol, Thin Film Lab, Beijing 100022, Peoples R China
  • [ 2 ] [Tan, T.]Beijing Univ Technol, Thin Film Lab, Beijing 100022, Peoples R China
  • [ 3 ] [Wang, B.]Beijing Univ Technol, Thin Film Lab, Beijing 100022, Peoples R China
  • [ 4 ] [Zhai, R.]Beijing Univ Technol, Thin Film Lab, Beijing 100022, Peoples R China
  • [ 5 ] [Song, X.]Beijing Univ Technol, Thin Film Lab, Beijing 100022, Peoples R China
  • [ 6 ] [Li, E.]Beijing Univ Technol, Thin Film Lab, Beijing 100022, Peoples R China
  • [ 7 ] [Wang, H.]Beijing Univ Technol, Thin Film Lab, Beijing 100022, Peoples R China
  • [ 8 ] [Yan, H.]Beijing Univ Technol, Thin Film Lab, Beijing 100022, Peoples R China

通讯作者信息:

  • 王波

    [Wang, B.]Beijing Univ Technol, Thin Film Lab, Beijing 100022, Peoples R China

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来源 :

JOURNAL OF COLLOID AND INTERFACE SCIENCE

ISSN: 0021-9797

年份: 2008

期: 2

卷: 320

页码: 540-547

9 . 9 0 0

JCR@2022

ESI学科: CHEMISTRY;

JCR分区:2

被引次数:

WoS核心集被引频次: 36

SCOPUS被引频次: 39

ESI高被引论文在榜: 0 展开所有

万方被引频次:

中文被引频次:

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