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作者:

Li, Tong (Li, Tong.) | Pei, Zhijun (Pei, Zhijun.) | Sun, Shoumei (Sun, Shoumei.) | Ma, Xingbing (Ma, Xingbing.) | Gu, Jinqing (Gu, Jinqing.) | Zhang, Ming (Zhang, Ming.) | Wang, Bo (Wang, Bo.) (学者:王波) | Yan, Hui (Yan, Hui.)

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EI Scopus SCIE

摘要:

La0.85Sr0.15MnO3 (LSMO)/TiO2 heterostructures were synthesized by RF magnetron sputtering with different LSMO thicknesses. Rectifying properties of the junctions are related to the LSMO thickness and good rectifying properties appear in a LSMO (100 nm)/TiO2 junction. Furthermore, the excellent rectifying characteristic is presented in a relatively wide temperature range for LSMO (100 nm)/TiO2 heterostructures. All samples exhibit a huge effective resistance which plays an important role in the current-voltage curves as well as the rectifying properties. The diffusion potential of the heterostructures decreases with increasing measurement temperature, which is attributed to the modulation of the interface electronic structure of LSMO/TiO2 heterostructures. It is worth noting that the metal-insulator (M-I) transition of LSMO also appears in the heterostructures and the increased sheet resistance of heterostructures at low temperature is related to the introduction of TiO2.

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作者机构:

  • [ 1 ] [Li, Tong]Tianjin Univ Technol & Educ, Dept Elect Engn, Tianjin 300222, Peoples R China
  • [ 2 ] [Pei, Zhijun]Tianjin Univ Technol & Educ, Dept Elect Engn, Tianjin 300222, Peoples R China
  • [ 3 ] [Sun, Shoumei]Tianjin Univ Technol & Educ, Dept Elect Engn, Tianjin 300222, Peoples R China
  • [ 4 ] [Ma, Xingbing]Tianjin Univ Technol & Educ, Dept Elect Engn, Tianjin 300222, Peoples R China
  • [ 5 ] [Li, Tong]Beijing Univ Technol, Thin Film Lab, Beijing 100022, Peoples R China
  • [ 6 ] [Zhang, Ming]Beijing Univ Technol, Thin Film Lab, Beijing 100022, Peoples R China
  • [ 7 ] [Wang, Bo]Beijing Univ Technol, Thin Film Lab, Beijing 100022, Peoples R China
  • [ 8 ] [Yan, Hui]Beijing Univ Technol, Thin Film Lab, Beijing 100022, Peoples R China

通讯作者信息:

  • [Li, Tong]Tianjin Univ Technol & Educ, Dept Elect Engn, Tianjin 300222, Peoples R China

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来源 :

SEMICONDUCTOR SCIENCE AND TECHNOLOGY

ISSN: 0268-1242

年份: 2008

期: 4

卷: 23

1 . 9 0 0

JCR@2022

ESI学科: PHYSICS;

JCR分区:2

被引次数:

WoS核心集被引频次: 4

SCOPUS被引频次: 5

ESI高被引论文在榜: 0 展开所有

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