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作者:

Liu, NX (Liu, NX.) | Wang, HB (Wang, HB.) | Liu, JP (Liu, JP.) (学者:刘加平) | Niu, NH (Niu, NH.) | Han, J (Han, J.) | Shen, GD (Shen, GD.)

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摘要:

The p-type GaN(p-GaN) samples grown at low temperature 870-980 degrees C on sapphire substrate were prepared by the metal organic chemical vapor deposition technique(MOCVD), and their electrical properties were investigated. The p-GaN samples grown below 900 degrees C show high-resistivity, and samples grown at above 900 degrees C have good conductivity. In addition, the electrical properties are also related with the doping level and the growth condition of p-GaN. The low N-Ga mole ratio leads to poor conductivity, the high ratio leads to rough morphology. At last, we use the optimized p-GaN to fabricate the green-light emitting diodes. We found that when the growth temperature is lower, the luminescence intensity and reverse voltage is higher but the forward voltage increases slightly.

关键词:

GaN III-Vsemiconductors light emitting diodes metal organic chemical vapor deposition

作者机构:

  • [ 1 ] Beijing Univ Technol, Beijing Optoelect Technol Lab, Beijing 100022, Peoples R China

通讯作者信息:

  • [Liu, NX]Beijing Univ Technol, Beijing Optoelect Technol Lab, Beijing 100022, Peoples R China

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来源 :

ACTA PHYSICA SINICA

ISSN: 1000-3290

年份: 2006

期: 3

卷: 55

页码: 1424-1429

1 . 0 0 0

JCR@2022

ESI学科: PHYSICS;

JCR分区:2

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