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[期刊论文]

Ion cleaning of facets for improving the reliability of high power 980 nm semiconductor lasers

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作者:

Shu, XW (Shu, XW.) | Xu, C (Xu, C.) (学者:徐晨) | Tian, ZX (Tian, ZX.) | 展开

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Scopus SCIE CSCD

摘要:

We report a simple and available way of improving the reliability of high power InGaAs 980 nm lasers by cleaning the facets using Ar ion before the protecting films have been coated. The Ar cleaning can remove the impurity and the oxide on the air-cleaved facets of laser diodes. It is proven that the way has marked effect on reducing the gradual degradation rate of laser diodes and improving the catastrophic-optical-damage threshold.

作者机构:

  • [ 1 ] Beijing Univ Technol, Beijing Optoelect Technol Lab, Beijing 100022, Peoples R China

通讯作者信息:

  • [Shu, XW]Beijing Univ Technol, Beijing Optoelect Technol Lab, Beijing 100022, Peoples R China

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来源 :

CHINESE PHYSICS LETTERS

ISSN: 0256-307X

年份: 2006

期: 1

卷: 23

页码: 124-125

3 . 5 0 0

JCR@2022

ESI学科: PHYSICS;

JCR分区:2

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