in　order　to　obtain　a　compact-structure,　saving-energy　and　good-property　system　based　on　the　conventional　microwave　electron-cyclotron　resonance　chemical　vapor　deposition　(MWECR-CVD)　system,　we　proposed　a　new　technique　using　a　magnetic　field　combination　of　an　electromagnetic　coil　and　a　permanent　magnet　unit,　as　well　as　adopting　a　dedicated　microwave　coupling　structure.　The　experiment　results　showed　that　by　using　this　new　optimized　system　the　deposition　rate　can　reach　more　than　2.5　nm/s,　and　the　photosensitivity　of　a-Si:H　films　can　be　up　to　1.1　x　10(5).　(c)　2004　Elsevier　Ltd.　All　rights　reserved.