We　have　extended　the　chemical　bath　deposition　technique　modified　by　microwave　irradiation　to　rapidly　deposit　ternary　oxide　Eu:YVO4　thin　films.　The　obtained　films　are　dense,　adherent,　and　mirror-like.　Structure　(XRD),　morphological　(TEM),　and　optical　(UV-vis-NIR　and　PL)　characterizations　of　the　films　are　presented.　The　results　indicate　that　the　deposited　Eu:YVO4　films　with　(002)　preferential　orientation　consisted　of　nano-size　grains　and　had　strong　emission　under　UV　excitation.　The　kinetic　mechanism　of　this　novel　solution　processing　has　been　investigated.