Translated Title
Optimizing of Hot Filament Parameters on High Quality Diamond Films Deposition by HFCVD
Translated Abstract
A hot filaments and substrate thermal model is used to explain the correlation between the geometry parameters of the hot filaments and the uniform of diamond films. Applying this model, both the irradiance field and the temperature field are calculated for diamond films in large area growth by hot filament assisted chemical vapor deposition (HFCVD). According to the results, the uniform of diamond films is rather determined by the irradiance field than the temperature field, which is in agreement with the experimental data. Moreover, the suitable geometry parameters to deposit diamond films on 100mm×100mm area are given.
Translated Keyword
hot filament
diamond films
CVD
Access Number
WF:perioarticalrgjtxb98200003012
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