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作者:

Wang, BB (Wang, BB.) | Lee, S (Lee, S.) | Xu, XZ (Xu, XZ.) | Choi, SH (Choi, SH.) | Yan, H (Yan, H.) | Zhang, B (Zhang, B.) | Hao, W (Hao, W.)

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EI Scopus SCIE

摘要:

Carbon nanotubes were prepared on silicon wafers deposited with NiFe catalyst films and Ta buffer films by plasma-enhanced hot filament chemical vapor deposition, and growth of the carbon nanotubes under different pressure were investigated by scanning electron microscopy. It is found that the average length of the carbon nanotubes grown at the pressure of 15 Torr is larger than that at the pressure of 30 Torr. But, it is difficult to grow the carbon nanotubes when the pressure is 5 Torr. These indicate that the pressure greatly influences on the growth of carbon nanotubes. Combined with theories related to thermodynamics of alloy and glow discharge, it is analyzed and discussed that the pressure affects the growth of the carbon nanotubes. (C) 2004 Elsevier B.V. All rights reserved.

关键词:

carbon nanotubes chemical vapor deposition glow discharge

作者机构:

  • [ 1 ] Beijing Univ Technol, Coll Appl Math & Phys, Beijing 100022, Peoples R China
  • [ 2 ] Ajou Univ, Dept Mol Sci & Technol, Suwon 442749, South Korea
  • [ 3 ] Chongqing Univ, Coll Mat Sci & Engn, Chongqing 400044, Peoples R China
  • [ 4 ] Beijing Univ Technol, Quantum Mat Lab, Beijing 100022, Peoples R China

通讯作者信息:

  • [Wang, BB]Beijing Univ Technol, Coll Appl Math & Phys, 100 Pingleyuan, Beijing 100022, Peoples R China

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来源 :

APPLIED SURFACE SCIENCE

ISSN: 0169-4332

年份: 2004

期: 1-4

卷: 236

页码: 6-12

6 . 7 0 0

JCR@2022

ESI学科: MATERIALS SCIENCE;

JCR分区:2

被引次数:

WoS核心集被引频次: 17

SCOPUS被引频次: 16

ESI高被引论文在榜: 0 展开所有

万方被引频次:

中文被引频次:

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