CNx,　thin　films　with　a　high　nitrogen　content　were　prepared　on　ITO　conductive,　glass　substrates　by　cathode　electrodeposition,　using　dicyandiamide(C2H4N4)　in　acetone　as　the　precursors.　The　surface　morphologies　of　CNx　thin　films　were　observed　by　thermal　field　emission　scanning　electron　microscopy　(SEM)　The　size　of　CNx　got　a　nanometer　level,　with　about　80　nm　minimum　size.　The　N　/C　atomic　ratio　and　bond　state　in　the　films　were　studied　by　X-ray　photoelectron　spectroscopy　(XPS).　The　maximum　value　of　the　N/　C　atomic　ratio　was　1.　08.　Carbon　and　nitrogen　existed　mainly　in　the　form　of　C-N　bond,　with　little　C　=　N　bond.　Fourier　transform　infrared　(FTIR)　spectroscopy　supports　the　existence　of　C　-N　covalent　bond.　Through　the　UV-Vis.　absorption　phenomenon,　the　ultraviolet　radiation　(200-280　nm)　could　be　transmitted.　The　electrical　resistivities　of　the　films　were-in　the-range　of　10(12)-10(16)　Omega　.　cm.